IP Library Granted Patent US 8,168,448
Granted Patent B2
US 8,168,448 · App. 12/106,165 · Granted May 1, 2012

Ferroelectric register, and method for manufacturing capacitor of the same

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 8,168,448
App. No.
12/106,165
Granted
May 1, 2012
Kind
B2
Abstract

The present invention discloses a ferroelectric register and a method for manufacturing a capacitor of the same. The ferroelectric register is configured to reduce probability of data storage failure due to a weak state capacitor, by connecting a plurality of capacitors in parallel in a ferroelectric capacitor unit for storing data, instead of using a single capacitor, thereby improving storage reliability and stability. In addition, the ferroelectric register obtains a data sensing margin by pumping a cell plate signal into not a power voltage level but a pumping voltage level.

Claims (6)

1. A method for manufacturing a ferroelectric capacitor of a ferroelectric register, which includes a pull-up switch for outputting a power voltage when a pull-up enable signal is activated; a pull-up driving unit for receiving the power voltage from the pull-up switch, and for pulling up a voltage of a data storage node to the power voltage; a write enable control unit for transmitting a differential data to the data storage node according to a write control signal; the ferroelectric capacitor connected between the data storage node and a plate line and storing the differential data when a cell plate signal from the plate line is activated; a pull-down switch for transmitting a ground voltage to the data storage node when a pull-down enable signal is activated; and a pull-down driving unit for receiving the ground voltage from the pull-down switch and for pulling down the voltage of the data storage node to the ground voltage, comprising:

a first process for forming a contact plug on a bit line;

a second process for sequentially stacking a first electrode layer, a first ferroelectric layer, a second electrode layer, a second ferroelectric layer and a third electrode layer on the contact plug; and

a third process for electrically connecting the bit line to the third electrode layer by forming a metal line, which has one end connected to the third electrode and the other end connected to the bit line,

wherein the bit line is electrically connected with the data storage node and the second electrode layer is electrically connected with the plate line.

2. The method of claim 1 , wherein the metal line has one end that is directly connected to the third electrode and the other end directly connected to the bit line.

Assignments (3)
CORRECTIVE ASSIGNMENT TO CORRECT THE ASSIGNEE IS HYNIX SEMICONDUCTOR INC. NOT HYNIX-SEMICONDUCTOR INC. THERE IS NO HYPHEN IN THE NAME. PREVIOUSLY RECORDED ON REEL 67328 FRAME 814. ASSIGNOR(S) HEREBY CONFIRMS THE CHANGE OF NAME. Recorded May 14, 2024
From: HYNIX SEMICONDUCTOR INC.
To: SK HYNIX INC.
Reel/Frame 067412/0482 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 9, 2024
From: SK HYNIX INC.
To: MIMIRIP LLC
Reel/Frame 067369/0832 →
CHANGE OF NAME Recorded May 6, 2024
From: HYNIX-SEMICONDUCTOR INC.
To: SK HYNIX INC.
Reel/Frame 067328/0814 →