Integrated circuit with an active area line having at least one form-supporting element and corresponding method of making an integrated circuit
View Patent ↗An integrated circuit is described. The integrated circuit may have: an active area line formed of a material of a semiconductor substrate with a first longitudinal direction parallel to an upper surface of the semiconductor substrate; wherein the active area line has at least one form-supporting element extending in a second longitudinal direction parallel to the upper surface of the semiconductor substrate; and wherein the second longitudinal direction is arranged with regard to the first longitudinal direction in an angle unequal to 0 degree and unequal to 180 degree.
1. An integrated circuit comprising:
an active area line formed of a material of a semiconductor substrate with a first longitudinal direction parallel to an upper surface of the semiconductor substrate;
wherein the active area line comprises at least one form-supporting element extending in a second longitudinal direction parallel to the upper surface of the semiconductor substrate; and
wherein the second longitudinal direction is arranged with regard to the first longitudinal direction in an angle unequal to 0 degree and unequal to 180 degree; and
wherein at least one second active area line is arranged on the integrated circuit, and wherein the form-supporting element extends through the at least two active area lines.
2. The integrated circuit of claim 1 , wherein the shape of the active area line with the at least one form-supporting element is defined by trenches etched into the semiconductor substrate.
3. The integrated circuit of claim 1 , wherein the active area line comprises a plurality of straight form-supporting elements that are arranged to each other in a way to form a zigzag-shaped line.
4. The integrated circuit of claim 1 , wherein the active area line comprises a plurality of non-straight form-supporting elements that are arranged to each other in a way to form an undulating-shaped line.
5. The integrated circuit of claim 1 , wherein the second longitudinal direction is arranged perpendicular with regard to the first longitudinal direction.
6. The integrated circuit of claim 2 , wherein at least one of the trenches is a non-straight trench.
7. The integrated circuit of claim 6 , wherein at least one of the trenches is a zigzag-shaped trench.
8. The integrated circuit of claim 6 , wherein at least one of the trenches is an undulating-shaped trench.
9. The integrated circuit of claim 6 , wherein at least one of the trenches has a periodic non-linear pattern.
10. , An integrated circuit comprising:
an active area line formed of a material of a semiconductor substrate with a first longitudinal direction parallel to an upper surface of the semiconductor substrate;
wherein the active area line comprises at least one form-supporting element extending in a second longitudinal direction parallel to the upper surface of the semiconductor substrate;
wherein the second longitudinal direction is arranged with regard to the first longitudinal direction in an angle unequal to 0 degree and unequal to 180 degree;
wherein the active area line comprises a plurality of non-straight form-supporting elements that are arranged to each other in a way to form an undulating-shaped line; and
wherein at least one second active area line is arranged on the integrated circuit, and wherein the form-supporting element extends through the at least two active area lines.
11. The integrated circuit of claim 10 , wherein the form-supporting element is covered at least partially by a source line.
12. An integrated circuit comprising:
an active area line formed of a material of a semiconductor substrate with a first longitudinal direction parallel to an upper surface of the semiconductor substrate;
wherein the active area line comprises at least one form-supporting element extending in a second longitudinal direction parallel to the upper surface of the semiconductor substrate; and
wherein the second longitudinal direction is arranged with regard to the first longitudinal direction in an angle unequal to 0 degree and unequal to 180 degree; and
wherein the form-supporting element is covered at least partially by a source line.