IP Library Granted Patent US 8,124,950
Granted Patent B2
US 8,124,950 · App. 12/198,383 · Granted Feb 28, 2012

Concentric phase change memory element

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Quick Facts
Patent No.
US 8,124,950
App. No.
12/198,383
Granted
Feb 28, 2012
Kind
B2
Abstract

A memory device including a first electrode; a second electrode; and a memory cell positioned between the first electrode and the second electrode, the memory cell including a core of a first phase change material and a cladding of a second phase change material, wherein the first phase change material has a lower crystallization temperature than the second phase change material.

Claims (4)

1. A memory device comprising:

a memory cell positioned between a first electrode and a second electrode, the memory cell comprising a core of a first phase change material that is in direct contact with the first electrode and the second electrode, and a cladding of a second phase change that is in direct contact with the first electrode and the second electrode, the cladding of the second phase change material being a continuous and conformal layer extending an entire height of the core of the first phase change material from the first electrode to the second electrode, wherein the first phase change material is different from the second phase change material, and the first phase change material has a lower crystallization temperature or shorter crystallization time than the second phase change material, and wherein the core and the cladding are of a concentric geometry.

2. The memory device of claim 1 , wherein the first phase change material comprises a substantially undoped material comprising GeSbTe, GeSb, SbTe, GeTe, AgInSbTe, or a combination thereof.

3. The memory device of claim 2 , wherein the second phase change material comprises a doped material comprising GeSbTe, GeSb, SbTe, GeTe, AgInSbTe, or a combination thereof, wherein a dopant is present in the second phase change material in a range from greater than about 1 wt % to about 10 wt %, the dopant comprising oxygen, nitrogen, silicon oxide, silicon, carbon, silicon carbide, silicon nitride dopant or a combination thereof.

Assignments (6)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 7, 2015
From: INFINEON TECHNOLOGIES AG
To: SAMSUNG ELECTRONICS CO., LTD.
Reel/Frame 037221/0885 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 8, 2015
From: QIMONDA AG
To: INFINEON TECHNOLOGIES AG
Reel/Frame 035623/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 26, 2013
From: QIMONDA NORTH AMERICA CORP.
To: QIMONDA AG
Reel/Frame 031677/0080 →
CORRECTIVE ASSIGNMENT TO CORRECT THE NAME OF THE ASSIGNOR PREVIOUSLY RECORDED ON REEL 021442 FRAME 0672. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Feb 2, 2012
From: HAPP, THOMAS D.
To: QIMONDA NORTH AMERICA CORP.
Reel/Frame 027645/0944 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 26, 2008
From: QIMONDA NORTH AMERICA CORP.
To: QIMONDA NORTH AMERICA CORP.
Reel/Frame 021442/0672 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 26, 2008
From: SCHROTT, ALEJANDRO G.
To: INTERNATIONAL BUSINESS MACHINES CORPORATION
Reel/Frame 021442/0749 →