Substrate processing system, control method for substrate processing apparatus and program stored on medium
The present invention provides a substrate processing system, a control method for a substrate processing apparatus, and a program for the system and/or method, each of which is intended to achieve effective control for a film-forming amount on processed substrates. The substrate processing system includes a substrate processing unit adapted for forming a film on each of the plurality of substrates; a pattern obtaining unit adapted for obtaining information about an arrangement pattern concerning arrangement of unprocessed substrates and processed substrates among the plurality of substrates; and a memory unit adapted for storing therein an arrangement/film-forming-amount model indicative of influence exerted on the film-forming amount on the substrates by the arrangement of the unprocessed substrates and processed substrates among the plurality of substrates. A calculation unit calculates an estimated film-forming amount on the substrates, in the case of the arrangement pattern, based on the arrangement/film-forming-amount model. Then, a determination unit determines whether or not the estimated film-forming amount calculated by the calculation unit is within a predetermined range. If the estimated film-forming amount calculated by the calculation unit is determined to be within the predetermined range, a control unit will control and drive the substrate processing unit to process the substrates.
1. A substrate processing system, comprising:
a substrate processing unit which is adapted for storing therein a plurality of substrates including unprocessed substrates and processed substrates respectively arranged in a multistage fashion as well as adapted for providing a heating process and a gas supplying process to the plurality of substrates, so as to form a film on each of the plurality of substrates;
a pattern obtaining unit adapted for obtaining information about an arrangement pattern concerning arrangement of the unprocessed substrates and processed substrates among the plurality of the substrates;
a first memory unit adapted for storing therein an arrangement/film-forming-amount model indicative of influence exerted on a film-forming amount on the substrates by the arrangement pattern concerning the arrangement of the unprocessed substrates and processed substrates among the plurality of substrates;
a calculation unit adapted for calculating an estimated film-forming amount on the substrates, in the case of the arrangement pattern obtained by the pattern obtaining unit, based on the arrangement/film-forming-amount model stored in the first memory unit;
a determination unit adapted for determining whether or not the estimated film-forming amount calculated by the calculation unit is within a predetermined range; and
a control unit adapted for controlling and driving the substrate processing unit to process the substrates when the estimated film-forming amount calculated by the calculation unit is determined to be within the predetermined range.
2. The substrate processing system according to claim 1 ,
wherein the calculation unit further calculates the estimated film-forming amount on a plurality of monitor substrates included in the plurality of substrates, and
wherein the determination unit further determines whether or not the estimated film-forming amount and uniformity thereof on each of the plurality of monitor substrates are within predetermined ranges, respectively.
3. The substrate processing system according to claim 1 , further comprising:
a second memory unit adapted for storing therein a temperature/film-forming-amount model indicative of influence exerted on the film-forming amount on the substrates by a processing temperature for the substrates; and
a temperature determination unit adapted for determining the processing temperature, based on the temperature/film-forming-amount model stored in the second memory unit, when the estimated film-forming amount calculated by the calculation unit is determined to be out of the predetermined range;
wherein the control unit controls the substrate processing unit, based on the processing temperature determined by the temperature determination unit.
4. The substrate processing system according to claim 3 ,
wherein the substrate processing unit includes a plurality of heating units each adapted for heating the substrates, and
wherein the temperature determination unit determines a processing temperature corresponding to each of the plurality of heating units, based on the temperature/film-forming-amount model stored in the second memory unit, when uniformity of the estimated film-forming amount calculated by the calculation unit is determined to be out of predetermined range.
5. A control method for controlling a substrate processing apparatus which is adapted for storing therein a plurality of substrates including unprocessed substrates and processed substrates respectively arranged in multistage fashion as well as adapted for providing a heating process and a gas supplying process to the plurality of substrates, so as to form a film on each of the plurality of substrates, the method comprising the steps of:
obtaining information about an arrangement pattern concerning arrangement of the unprocessed substrates and processed substrates among the plurality of substrates;
calculating an estimated film-forming amount on the substrates, in the case of the arrangement pattern, based on an arrangement/film-forming-amount model indicative of influence exerted on a film-forming amount on the substrates by the arrangement pattern concerning the arrangement of the unprocessed substrates and processed substrates among the plurality of substrates;
determining whether or not the estimated film-forming amount calculated in the calculating step is within a predetermined range; and
controlling the substrate processing apparatus when the estimated film-forming amount calculated in the calculating step is determined to be within the predetermined range.
6. A non-transitory storage medium storing therein a computer program configured for driving a computer to perform a control method for a substrate processing apparatus,
wherein the method is configured for controlling the substrate processing apparatus which is adapted for storing therein a plurality of substrates including unprocessed substrates and processed substrates respectively arranged in a multistage fashion as well as adapted for providing a heating process and a gas supplying process to the plurality of substrates, so as to form a film on each of the plurality of substrates, and
wherein the method comprises steps of:
obtaining information about an arrangement pattern concerning arrangement of the unprocessed substrates and processed substrates among the plurality of substrates;
calculating an estimated film-forming amount on the substrates, in the case of the arrangement pattern, based on an arrangement/film-forming-amount model indicative of influence exerted on a film-forming amount on the substrates by the arrangement pattern concerning the arrangement of the unprocessed substrates and processed substrates among the plurality of substrates;
determining whether or not the estimated film-forming amount calculated in the calculating step is within a predetermined range; and
controlling the substrate processing apparatus when the estimated film-forming amount calculated in the calculating step is determined to be within the predetermined range.