Surface contamination analyzer for semiconductor wafers
A semiconductor wafer is radiated with an electron beam so that the inelastic scattering takes place in the narrow region, and current flows out from the narrow region; the amount of current is dependent on the substance or substances in the narrow region so that the analyst evaluates the degree of contamination on the basis of the substance or substances specified in the narrow region.
1. A surface contamination analyzer configured to investigate contamination on a target region of a wafer, comprising:
means for irradiating the target region with an electron beam;
means for measuring the amount of current generated from the semiconductor wafer in response to the irradiating the target region with the electron beam;
means for comparing the amount of current generated in response to the irradiation of the target region with a reference current and determining a difference therebetween to detect at least one contaminant on or in the target region.
2. The surface contamination analyzer of claim 1 further comprising:
means for changing an incident angle of the electron beam on the target region between a first incident angle and a second incident angle,
wherein the means for comparing compares the reference current with each of an amount of current generated in response to the irradiation of the target region at the first incident angle and an amount of a current generated in response to the irradiation of the target region at the second incident angle.
3. The surface contamination analyzer of claim 1 further comprising:
means for changing an acceleration energy of the electron beam between first and second acceleration energies
wherein the means for comparing compares the reference current with each of a first amount of current generated in response to the irradiation of the target region with the first acceleration energy and a second amount of a current generated in response to the irradiation of the target region with the second acceleration energy.
4. The surface contamination analyzer of claim 1 further comprising:
means for generating a three-dimensionally representation of the degree of contamination using the first amount of current and the second amount of current.
5. The surface contamination analyzer of claim 1 , further comprising:
means for measuring a first amount of current generated in response to the irradiation of the target region at a first temperature; and
means for measuring a second amount of current generated in response to the irradiation of the target region at a second temperature.
6. The surface contamination analyzer of claim 5 , further including:
means for detecting a difference between the first amount of current and the second amount of current.
7. The surface contamination analyzer of claim 5 , further including:
means for generating a three-dimensionally representation of the degree of contamination using the first amount of current and the second amount of current.
8. The surface contamination analyzer of claim 1 , wherein the reference current is such a current generated by irradiating a substrate having a predetermined surface with an electron beam.
9. The surface contamination analyzer of claim 1 , wherein the reference current is such a current generated by irradiating a region of a reference wafer with an electron beam.
10. A surface contamination analyzer configured to investigate contamination on a target region of a wafer, comprising:
an electron gun for irradiating the target region with an electron beam;
an electrode for attachment to the wafer;
a meter connected to the electrode for measuring the amount of current generated from the semiconductor wafer in response to the irradiating the target region with the electron beam;
means for comparing the amount of current generated in response to the irradiation of the target region with a reference current and determining a difference therebetween to detect at least one contaminant on or in the target region.
11. The surface contamination analyzer of claim 10 further comprising:
means for changing an incident angle of the electron beam on the target region between a first incident angle and a second incident angle,
wherein the means for comparing compares the reference current with each of an amount of current generated in response to the irradiation of the target region at the first incident angle and an amount of a current generated in response to the irradiation of the target region at the second incident angle.
12. The surface contamination analyzer of claim 10 further comprising:
means for changing an acceleration energy of the electron beam between first and second acceleration energies
wherein the means for comparing compares the reference current with each of a first amount of current generated in response to the irradiation of the target region with the first acceleration energy and a second amount of a current generated in response to the irradiation of the target region with the second acceleration energy.
13. The surface contamination analyzer of claim 10 further comprising:
means for generating a three-dimensionally representation of the degree of contamination using the first amount of current and the second amount of current.
14. The surface contamination analyzer of claim 10 , further comprising:
means for measuring a first amount of current generated in response to the irradiation of the target region at a first temperature; and
means for measuring a second amount of current generated in response to the irradiation of the target region at a second temperature.
15. The surface contamination analyzer of claim 14 , further including:
means for detecting a difference between the first amount of current and the second amount of current.
16. The surface contamination analyzer of claim 14 , further including:
means for generating a three-dimensionally representation of the degree of contamination using the first amount of current and the second amount of current.
17. The surface contamination analyzer of claim 10 , wherein the reference current is such a current generated by irradiating a substrate having a predetermined surface with an electron beam.
18. The surface contamination analyzer of claim 10 , wherein the reference current is such a current generated by irradiating a region of a reference wafer with an electron beam.