Method for self-aligned doubled patterning lithography
Various embodiments of the invention provide systems and methods for semiconductor device fabrication and generation of photomasks for patterning a target layout of line features and large features. Embodiments of the invention are directed towards systems and methods using self-aligned double pattern to define the target layout of line features and large features.
1. A method of producing a dataset for creating a photomask set used in patterning a target layout of line features and large features in a circuit design, comprising:
receiving a layout dataset representing features of the circuit design;
deriving a first dataset representing line features within the layout dataset;
deriving a second dataset representing large features within the layout dataset;
generating, by a computer system, a first mask dataset from the first dataset, wherein the first mask dataset represents a first pattern comprising a first array of line features, the first array of line features defining a second array of line features when subsequent to a spacer-etch process spacer material remains adjacent vertical surfaces of the first array of lines, thereby forming the second array;
generating, by a computer system, a second mask dataset from the first dataset, wherein the second mask dataset represents portions of the second array of line features to be selectively removed, thereby forming the line features of the target layout; and
generating, by a computer system, a third mask dataset from the second dataset, wherein the third mask dataset represents a second pattern comprising the large features of the target layout.
2. The method of claim 1 , wherein the second array has a density of line features double that of the first array.
3. The method of claim 1 , wherein line features within the second array are narrower than a minimum critical dimension.
4. The method of claim 3 , wherein the large features of the target layout are wider than the minimum critical dimension.
5. The method of claim 1 , wherein the large features of the target layout include connections features, pad features, and logic devices.
6. A computer program product comprising a non-transitory computer readable medium having computer program code embodied therein for enabling a computing device to generate datasets for photolithography operations for patterning a target layout of line features and large features in a circuit design, the generation comprising:
receiving a layout dataset representing features of the circuit design;
deriving a first dataset representing line features within the layout dataset;
deriving a second dataset representing large features within the layout dataset;
generating a first mask dataset from the first dataset, wherein the first mask dataset represents a first pattern comprising a first array of line features, the first array of line features defining a second array of line features when subsequent to a spacer-etch process spacer material remains adjacent vertical surfaces of the first array of lines, thereby forming the second array;
generating a second mask dataset from the first dataset, wherein the second mask dataset represents portions of the second array of line features to be selectively removed, thereby forming the line features of the target layout; and
generating a third mask dataset from the second dataset, wherein the third mask dataset represents a second pattern comprising the large features of the target layout.
7. The computer program product of claim 1 , wherein the second array has a density of line features double that of the first array.
8. The computer program product of claim 6 , wherein line features within the second array are narrower than a minimum critical dimension.
9. The computer program product of claim 8 , wherein the large features of the target layout are wider than the minimum critical dimension.
10. The computer program product of claim 6 , wherein the large features of the target layout include connections features, pad features, and logic devices.
11. A computer aided design tool, comprising:
a processor; and
a memory, coupled to the processor and having computer program code embodied therein for enabling the processor to generate datasets for photolithography operations for patterning a target layout of line features and large features in a circuit design, the generation comprising:
receiving a layout dataset representing features of the circuit design;
deriving a first dataset representing line features within the layout dataset;
deriving a second dataset representing large features within the layout dataset;
generating a first mask dataset from the first dataset, wherein the first mask dataset represents a first pattern comprising a first array of line features, the first array of line features defining a second array of line features when subsequent to a spacer-etch process spacer material remains adjacent vertical surfaces of the first array of lines, thereby forming the second array;
generating a second mask dataset from the first dataset, wherein the second mask dataset represents portions of the second array of line features to be selectively removed, thereby forming the line features of the target layout; and
generating a third mask dataset from the second dataset, wherein the third mask dataset represents a second pattern comprising the large features of the target layout.
12. The computer aided design tool of claim 11 , wherein the second array has a density of line features double that of the first array.
13. The method computer aided design tool of claim 11 , wherein line features within the second array are narrower than a minimum critical dimension.
14. The method computer aided design tool of claim 13 , wherein the large features of the target layout are wider than the minimum critical dimension.
15. The method computer aided design tool of claim 11 , wherein the large features of the target layout include connections features, pad features, and logic devices.