IP Library Assignment 070519/0972
Patent Assignment
Reel/Frame 070519/0972

Assignment of Assignor's Interest

Recorded: 2025-03-14 Pages: 12
Assignor
CADENCE DESIGN SYSTEMS, INC.
Executed: 2025-03-04
Assignee
SILVACO, INC.
4701 PATRICK HENRY DR., BUILDING 23, SANTA CLARA, CALIFORNIA, 95054
Covered Properties (29)
System and Method for Reducing Patterning Variability in Integrated Circuit Manufacturing Through Mask Layout Corrections
Patent: 7,318,214 →
Application: 10/841,079 →
Correcting Design Data for Manufacture
Patent: 7,275,225 →
Application: 10/860,852 →
Publication: US 2005/0273734
Method of Characterizing Flare
Patent: 7,277,165 →
Application: 10/860,853 →
Publication: US 2005/0270523
Method and System for Designing Manufacturable Patterns That Account for the Pattern- and Position-Dependent Nature of Patterning Processes
Patent: 7,266,800 →
Application: 10/861,170 →
Publication: US 2005/0273753
Method for Correcting Position-Dependent Distortions in Patterning of Integrated Circuits
Patent: 7,246,343 →
Application: 10/933,192 →
Publication: US 2006/0048091
Frequency Division Multiplexing (Fdm) Lithography
Patent: 7,879,538 →
Application: 10/949,678 →
Publication: US 2005/0064347
Method and System for Semiconductor Design Hierarchy Analysis and Transformation
Patent: 7,669,158 →
Application: 10/955,067 →
Publication: US 2006/0075371
Method and System for Managing Design Corrections for Optical and Process Effects Based on Feature Tolerances
Patent: 7,337,421 →
Application: 10/955,527 →
Publication: US 2006/0075379
Method and System for Reticle-Wide Hierarchy Management for Representational and Computational Reuse in Integrated Circuit Layout Design
Patent: 7,401,319 →
Application: 11/021,783 →
Publication: US 2006/0143589
Modeling Resolution Enhancement Processes in Integrated Circuit Fabrication
Patent: 7,653,890 →
Application: 11/096,469 →
Publication: US 2005/0268256
Apparatus and Method for Segmenting Edges for Optical Proximity Correction
Patent: 7,743,358 →
Application: 11/203,498 →
Publication: US 2006/0248496
Method and Apparatus of Model-Based Photomask Synthesis
Patent: 7,480,891 →
Application: 11/203,505 →
Publication: US 2006/0248495
Apparatus and Method for Breaking Up and Merging Polygons
Patent: 7,506,300 →
Application: 11/203,522 →
Publication: US 2006/0248499
Method of Eliminating a Lithography Operation
Patent: 8,440,569 →
Application: 11/952,703 →
Publication: US 2009/0146322
Method for Double Patterning Lithography
Patent: 7,913,197 →
Application: 12/035,413 →
System and Method for Modifying a Data Set of a Photomask
Patent: 8,572,517 →
Application: 12/136,277 →
Publication: US 2009/0307649
System and Method for Model Based Multi-Patterning Optimization
Patent: 8,069,423 →
Application: 12/189,692 →
Publication: US 2010/0037200
Method of Eliminating a Lithography Operation
Patent: 8,716,135 →
Application: 12/264,139 →
Method for Self-Aligned Doubled Patterning Lithography
Patent: 7,856,613 →
Application: 12/264,853 →
System and Method for Calibrating a Lithography Model
Patent: 8,279,409 →
Application: 12/536,425 →
Method, System, and Program Product for Routing an Integrated Circuit to Be Manufactured by Doubled Patterning
Patent: 8,782,586 →
Application: 12/582,366 →
Publication: US 2011/0014786
Method, System, and Program Product for Routing an Integrated Circuit to Be Manufactured by Sidewall-Image Transfer
Patent: 8,549,458 →
Application: 12/614,911 →
Publication: US 2011/0113393
Method and System for Semiconductor Design Hierarchy Analysis and Transformation
Patent: 9,038,002 →
Application: 12/640,960 →
Publication: US 2010/0153894
Method for Self-Aligned Doubled Patterning Lithography
Patent: 8,679,981 →
Application: 12/943,808 →
Frequency Division Multiplexing (Fdm) Lithography
Patent: 8,661,375 →
Application: 12/970,798 →
Publication: US 2011/0154274
Method of Eliminating a Lithography Operation
Patent: 8,656,321 →
Application: 13/183,749 →
System and Method for Model Based Multi-Patterning Optimization
Patent: 8,423,928 →
Application: 13/271,194 →
Publication: US 2012/0102442
System and Method for Modifying a Data Set of a Photomask
Patent: 9,292,627 →
Application: 14/065,359 →
Publication: US 2014/0068527
Full-Chip Hierarchical Inverse Lithography
Application: 15/444,118 →
Related Assignments (25)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest May 7, 2004
From: PRASAD, ROY V.; HORNG, CHI-SONG; RAMANUJAM, RAM S.
To: INVARIUM, INC.
Reel/Frame 015319/0510 →
Assignment of Assignor's Interest Jun 4, 2004
From: SEZGINER, ABDURRAHMAN
To: INVARIUM, INC.
Reel/Frame 015440/0623 →
Assignment of Assignor's Interest Jun 23, 2004
From: WU, BO; SEZGINER, ABDURRAHMAN
To: INVARIUM, INC.
Reel/Frame 014769/0443 →
Assignment of Assignor's Interest Jun 23, 2004
From: KAMAT, VISHNU G.
To: INVARIUM, INC.
Reel/Frame 014769/0440 →
Assignment of Assignor's Interest Sep 1, 2004
From: JOSHI, DEVENDRA; SEZGINER, ABDURRAHMAN; ZACH, FRANZ X.
To: INVARIUM, INC.
Reel/Frame 015769/0343 →
Assignment of Assignor's Interest Sep 24, 2004
From: WANG, YAO-TING
To: CLEAR SHAPE TECHNOLOGIES, INC.
Reel/Frame 015836/0804 →
Assignment of Assignor's Interest Sep 30, 2004
From: KAMAT, VISHNU GOVIND
To: INVARIUM, INC.
Reel/Frame 015867/0400 →
Assignment of Assignor's Interest Sep 30, 2004
From: KAMAT, VISHNU GOVIND
To: INVARIUM, INC.
Reel/Frame 015859/0771 →
Assignment of Assignor's Interest Dec 23, 2004
From: HORNG, CHI-SONG; JOSHI, DEVENDRA; LIU, ANWEI
To: INVARIUM, INC.
Reel/Frame 016125/0776 →
Assignment of Assignor's Interest Nov 25, 2005
From: SEZGINER, ABDURRAHMAN; YENIKAYA, BAYRAM; HUANG, HSU-TIRG
To: INVARIUM, INC.
Reel/Frame 017256/0368 →
Assignment of Assignor's Interest Dec 16, 2005
From: TSAI, CHI-MING; MAN, LAI-CHEE; WANG, YAO-TING; CHANG, FANG-CHENG
To: CLEAR SHAPE TECHNOLOGIES, INC.
Reel/Frame 017127/0316 →
Assignment of Assignor's Interest Oct 16, 2006
From: SEZGINER, ABDURRAHMAN
To: INVARIUM, INC.
Reel/Frame 018396/0437 →
Assignment of Assignor's Interest Oct 16, 2006
From: SEZGINER, ABDURRAHMAN; PRASAD, ROY
To: INVARIUM, INC.
Reel/Frame 018396/0430 →
Assignment of Assignor's Interest Dec 7, 2007
From: WELING, MILIND; SEZGINER, ABDURRAHMAN
To: CADENCE DESIGN SYSTEMS, INC.
Reel/Frame 020214/0713 →
Assignment of Assignor's Interest Jun 10, 2008
From: PRAMANIK, DIPANKAR; KRUGER, MICHIEL VICTOR PAUL; PRASAD, ROY V.; SEZGINER, ABDURRAHMAN
To: CADENCE DESIGN SYSTEMS, INC.
Reel/Frame 021071/0922 →
Assignment of Assignor's Interest Jun 19, 2008
From: INVARIUM, INC.
To: CADENCE DESIGN SYSTEMS, INC.
Reel/Frame 021123/0342 →
Assignment of Assignor's Interest Jun 19, 2008
From: INVARIUM, INC.
To: CADENCE DESIGN SYSTEMS, INC.
Reel/Frame 021122/0141 →
Assignment of Assignor's Interest Jun 19, 2008
From: INVARIUM, INC.
To: CADENCE DESIGN SYSTEMS, INC.
Reel/Frame 021122/0370 →
Assignment of Assignor's Interest Jun 19, 2008
From: INVARIUM, INC.
To: CADENCE DESIGN SYSTEMS, INC.
Reel/Frame 021122/0394 →
Assignment of Assignor's Interest Jun 19, 2008
From: INVARIUM, INC.
To: CADENCE DESIGN SYSTEMS, INC.
Reel/Frame 021122/0434 →
Assignment of Assignor's Interest Jun 19, 2008
From: INVARIUM, INC.
To: CADENCE DESIGN SYSTEMS, INC.
Reel/Frame 021122/0462 →
Assignment of Assignor's Interest Jun 19, 2008
From: INVARIUM, INC.
To: CADENCE DESIGN SYSTEMS, INC.
Reel/Frame 021122/0529 →
Assignment of Assignor's Interest Jun 19, 2008
From: INVARIUM, INC.
To: CADENCE DESIGN SYSTEMS, INC.
Reel/Frame 021122/0542 →
Assignment of Assignor's Interest Jun 19, 2008
From: INVARIUM, INC.
To: CADENCE DESIGN SYSTEMS, INC.
Reel/Frame 021122/0763 →
Assignment of Assignor's Interest Jun 19, 2008
From: CLEAR SHAPE TECHNOLOGIES, INC.
To: CADENCE DESIGN SYSTEMS, INC.
Reel/Frame 021123/0081 →