Frequency division multiplexing (FDM) lithography
Systems and methods for generating an image are provided. These systems and methods include generating multiple light beams from a light source by controlling at least one parameter of the light source to be different among each of the multiple light beams. The systems and methods further include forming multiple light patterns of circuit structures that are separated in frequency by directing each of the light beams at a mask of circuit features. The systems and methods, when used in lithography for example, further include directing each of the light patterns toward a silicon substrate. The silicon substrate includes a silicon wafer having a surface at least partially covered with at least one of a photoresist material and a reversible contrast enhancement material (R-CEM).
1. A non-transitory computer-readable medium including executable instructions which when executed by a processor-based system generates an image onto a substrate by:
generating a plurality of electromagnetic waves, wherein each electromagnetic wave has at least one property of light in a frequency domain that is different from properties of others in the plurality of electromagnetic waves;
exposing a feature mask of the image to the plurality of electromagnetic waves resulting in a plurality of light patterns being formed, wherein the feature mask has a plurality of mask feature sets comprising features that only respond to a specific property of light in the frequency domain, and wherein the plurality of light patterns form a light pattern of the image; and
projecting the plurality of light patterns towards a substrate that includes a surface at least partially covered with a photoresist material and a reversible contrast enhancement material (R-CEM).
2. A non-transitory computer-readable medium including executable instructions which when executed by a processor-based system models an image on a substrate by:
creating a first mask dataset having a plurality of mask feature sets, wherein each of the mask feature sets comprises features that only respond to a specific property of light in a frequency domain, wherein when exposed to a plurality of light beams the plurality of mask feature sets results in a plurality of light patterns being formed, and wherein the plurality of light patterns form a light pattern of the image;
modeling exposure of the first mask dataset to the plurality of light beams resulting in a light pattern being formed, wherein each of the light beams has at least one property of light in a frequency domain that is different from properties of others in the plurality of light beams and that corresponds to one of the mask feature sets; and
modeling projection of the light pattern onto the substrate.
3. The non-transitory computer-readable medium of claim 2 , wherein the processor-based system models the image on the substrate by further modeling the directing of each of the plurality of light patterns toward a silicon substrate, the silicon substrate including a silicon wafer having a surface at least partially covered with at least one of a photoresist material and a reversible contrast enhancement material (R-CEM).
4. The non-transitory computer-readable medium of claim 3 , wherein the modeling the directing of light further comprises providing a plurality of exposures of the silicon substrate separated in time by directing each of the plurality of light patterns toward the silicon substrate at a different time.
5. The non-transitory computer-readable medium of claim 2 , wherein the property of light includes at least one of polarization, frequency, phase, modulation, irradiance, illumination axis, focus position, exposure time, and exposure dosage.
6. The non-transitory computer-readable medium of claim 2 , wherein the processor-based system models the image on the substrate by further modeling the collimation of each of the plurality of light patterns.
7. The non-transitory computer-readable medium of claim 2 , wherein the mask is configured in accordance with the plurality of light beams so that a corresponding one of the mask feature sets are included in a corresponding one of the plurality of light patterns when the mask is illuminated with a corresponding one of the plurality of light beams.
8. The non-transitory computer-readable medium of claim 2 , wherein the formation of the plurality of light patterns further comprises directing each of the plurality of light beams towards at least one additional mask feature set.
9. The non-transitory computer-readable medium of claim 8 , wherein the directing each of the plurality of light beams towards the at least one additional mask feature set generates a second plurality of light patterns that include circuit structures separated in a spatial domain.
10. A processor-based system for modeling an image on a substrate, comprising:
a processor;
a memory connected to the processor; and
a non-transitory computer-readable medium including executable instructions which when executed by the processor models the image on the substrate by:
creating a first mask dataset having a plurality of mask feature sets, wherein each of the mask feature sets comprises features that only respond to a specific property of light in a frequency domain, wherein when exposed to a plurality of light beams the plurality of mask feature sets results in a plurality of light patterns being formed, and
wherein the plurality of light patterns form a light pattern of the image;
modeling exposure of the first mask dataset to the plurality of light beams resulting in a light pattern being formed, wherein each of the light beams has at least one property of light in a frequency domain that is different from properties of others in the plurality of light beams and that corresponds to one of the mask feature sets; and
modeling projection of the light pattern onto the substrate.
11. The processor-based system of claim 10 , wherein the processor models the image on the substrate by further modeling the directing of each of the plurality of light patterns toward a silicon substrate, the silicon substrate including a silicon wafer having a surface at least partially covered with at least one of a photoresist material and a reversible contrast enhancement material (R-CEM).
12. The processor-based system of claim 11 , the modeling the directing of light further comprises providing a plurality of exposures of the silicon substrate separated in time by directing each of the plurality of light patterns toward the silicon substrate at a different time.
13. The processor-based system of claim 10 , wherein the property of light includes at least one of polarization, frequency, phase, modulation, irradiance, illumination axis, focus position, exposure time, and exposure dosage.
14. The processor-based system of claim 10 , wherein the processor models the image on the substrate by further modeling the collimation of each of the plurality of light patterns.
15. The processor-based system of claim 10 , wherein the mask is configured in accordance with the plurality of light beams so that a corresponding one of the mask feature sets is included in a corresponding one of the plurality of light patterns when the mask is illuminated with a corresponding one of the plurality of light beams.
16. The processor-based system of claim 10 , wherein the formation of the plurality of light patterns further comprises the processor directing each of the plurality of light beams towards at least one additional mask feature set.
17. The processor-based system of claim 16 , wherein the directing each of the plurality of light beams towards the at least one additional mask feature set generates a second plurality of light patterns that include circuit structures separated in a spatial domain.