Method of forming a bump structure using an etching composition for an under bump metallurgy layer

1. A method of forming a bump structure, comprising:

forming a pad electrically connected to a semiconductor chip on a substrate;

forming a passivation layer pattern on the substrate, the passivation layer pattern exposing the pad;

forming an under-bump metallurgy (UBM) layer on the passivation layer pattern and on the pad exposed by the passivation layer pattern;

forming a conductive bump on the UBM layer; and

removing a portion of the UBM layer using the conductive bump as a mask with an etching composition including about 40% by weight to about 90% by weight of hydrogen peroxide (H 2 O 2 ), about 1% by weight to about 20% by weight of an aqueous basic solution including ammonium hydroxide (NH 4 OH) or tetraalkylammonium hydroxide, about 0.01% by weight to about 10% by weight of an alcohol compound, about 2% by weight to about 30% by weight of an ethylenediamine-based chelating agent, and a nonionic surfactant including a copolymer of polyethylene oxide and polypropylene oxide or a block copolymer of polyethylene glycol and polypropylene glycol.

2. The method as claimed in claim 1 , wherein a weight ratio of the aqueous basic solution including ammonium hydroxide to hydrogen peroxide is in a range of about 1:6 to about 1:9.

3. The method as claimed in claim 1 , wherein the etching composition comprises about 68% by weight to about 77% by weight of hydrogen peroxide, about 7% by weight to about 14% by weight of the aqueous basic solution including ammonium hydroxide, about 0.1% by weight to about 3% by weight of the alcohol compound, and about 15% by weight to about 20% by weight of the ethylenediamine-based chelating agent, and the UBM layer includes titanium (Ti).

4. The method as claimed in claim 1 , wherein the composition comprises about 75% by weight to about 83% by weight of hydrogen peroxide, about 1% by weight to about 7% by weight of the aqueous basic solution including tetraalkylammonium hydroxide, about 0.01% by weight to about 3% by weight of the alcohol compound, and about 15% by weight to about 20% by weight of the ethylenediamine-based chelating agent, and the UBM layer includes titanium tungsten (TiW).

5. The method as claimed in claim 1 , wherein removing the portion of the UBM layer includes etching the UBM layer using the etching composition at a temperature of about 40° C. to about 70° C. for about 1 minute to about 5 minutes.

6. The method as claimed in claim 1 , after removing the UBM layer, further comprising performing a heat treatment on the substrate on which the conductive bump is formed.

7. The method as claimed in claim 6 , after performing the heat treatment, further comprising cleaning the bump structure using the etching composition at a temperature of about 20° C. to about 40° C. for about 30 seconds to about 1 minute.

8. The method as claimed in claim 1 , wherein the UBM layer comprises at least one of titanium tungsten (TiW), chromium (Cr), copper (Cu), titanium (Ti), nickel (Ni), nickel vanadium (NiV), palladium (Pd), chromium/copper (Cr/Cu), titanium tungsten/copper (TiW/Cu), titanium tungsten/gold (TiW/Ag) and nickel vanadium/copper (NiV/Cu).

9. The method as claimed in claim 1 , wherein the aqueous basic solution includes about 25% by weight to about 50% by weight of ammonium hydroxide or about 15% by weight to about 35% by weight of tetraalkylammonium hydroxide.

10. The method as claimed in claim 1 , wherein the pad includes aluminum and the passivation layer includes at least one of polyimide or silicon oxynitride.

11. The method as claimed in claim 1 , further comprising about 1 ppm to about 1,000 ppm of the nonionic surfactant.