Electrode structure and semiconductor device
View Patent ↗In a power MOS transistor, for example, a source electrode is formed so as to be commonly connected to a plurality of source regions formed on the front surface. Thus, a current density varies based on in-plane resistance of the source electrode, thereby providing the necessity of increasing the number of wires connecting the sources and a lead. In the invention, an electrode structure includes a copper plating layer 10 e formed on a pad electrode 10 a by an electrolytic plating method, and a nickel plating layer 10 f and a gold plating layer formed so as to cover the upper and side surfaces of the copper plating layer 10 e by an electroless plating method.
1. A semiconductor device comprising:
a plurality of operation cells formed in a semiconductor substrate;
a first electrode disposed on a front surface of the semiconductor substrate so as to be connected to the operation cells, the operation cells being configured to allow current flows in a vertical direction of the semiconductor substrate; and
a first external connection terminal electrically connected to the first electrode at a bonding portion,
wherein the first electrode comprises a copper plating layer and a cover layer covering a side surface of the copper plating layer, and the cover layer does not cover a top surface of the copper plating layer and comprises a metal layer for preventing oxidation of the copper plating layer.
2. The semiconductor device of claim 1 , wherein the first electrode is connected to a wire connected to the first external connection terminal at the bonding portion with a conductive paste.
3. The semiconductor device of claim 1 , wherein the first electrode is connected to a metal frame connected to the first external connection terminal at the bonding portion with a conductive paste, and the metal frame has a smaller surface area than the first electrode.
4. The semiconductor device of claim 1 , wherein the first external terminal comprises a first bump electrode, the semiconductor substrate is formed so as to be mounted facedown on a conductive pattern of a mounting substrate, and the first bump electrode is formed corresponding to the conductive pattern.
5. The semiconductor device of claim 4 , wherein the semiconductor substrate comprises a second electrode formed on a back surface thereof, and the second electrode is electrically led to the front surface side of the semiconductor substrate by a leading frame extending from the back surface side to the front surface side.
6. The semiconductor device of claim 4 , wherein the semiconductor substrate comprises a low resistance region extending in the vertical direction of the semiconductor substrate in a region where the operation cells are not formed, and a current is led from the back surface of the semiconductor substrate through the low resistance region to the front surface of the semiconductor substrate.