Reagent activator for electroless plating
View Patent ↗A method for electroless plating of a substrate is provided that comprises exposing an electroless plating reagent comprising a metal to be plated and at least one reducing agent to a solid phase Activation Material to form an activated electroless plating reagent prior to application of the electroless plating reagent to the substrate. The activated electroless plating reagent is applied to a substrate in the process chamber under conditions to cause the metal of the electroless plating reagent to deposit on the substrate. Systems and modules are also described.
1. A tool for plating a substrate, comprising
a) a process chamber for positioning a substrate;
b) an electroless plating reagent pathway through which the electroless plating reagent travels and is dispensed to the substrate; and
c) a surface in the pathway comprising an Activation Material to which the electroless plating reagent is exposed prior to being dispensed to the substrate, wherein the Activation Material comprises a metal selected from copper, nickel or cobalt.
2. The tool of claim 1 , wherein the chamber is constructed to position a semiconductor wafer.
3. The tool of claim 1 , wherein the tool is a single wafer processing tool.
4. The tool of claim 1 , wherein the electroless plating reagent pathway is located outside of the process chamber.
5. The tool of claim 1 , wherein the Activation Material has a surface area of from about 1 cm 2 /g to about 20 cm 2 /g.
6. The tool of claim 1 , wherein the Activation Material is in the form of particles comprising the Activation Material at least on a portion of the surface of the particles.
7. The tool of claim 1 , wherein the Activation Material comprises copper.
8. The tool of claim 1 , wherein the Activation Material comprises nickel.
9. The tool of claim 1 , wherein the Activation Material comprises cobalt.