IP Library Granted Patent US 8,164,195
Granted Patent B2
US 8,164,195 · App. 12/336,390 · Granted Apr 24, 2012

Pad structure of semiconductor integrated circuit apparatus

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Quick Facts
Patent No.
US 8,164,195
App. No.
12/336,390
Granted
Apr 24, 2012
Kind
B2
Abstract

A pad structure of a semiconductor integrated circuit apparatus includes a semiconductor substrate upon which circuit patterns forming a device are disposed, a pad disposed on an uppermost part of the semiconductor substrate, and a plurality of fixing parts, each disposed along opposing edge portions of the pad to fix the pad and the semiconductor substrate to each other.

Claims (35)

1. A pad structure of a semiconductor integrated circuit apparatus, comprising:

a semiconductor substrate upon which circuit patterns forming a device are disposed;

a pad disposed on an uppermost part of the semiconductor substrate;

a plurality of fixing parts, each disposed along opposing edge portions of the pad to fix the pad and the semiconductor substrate to each other;

a signal line disposed on at least one side of the pad; and

a blocking wire disposed between the signal line and the pad to prevent signal crosstalk.

2. The pad structure of claim 1 , wherein the plurality of fixing parts is disposed between the semiconductor substrate and the pad.

3. The pad structure of claim 2 , wherein each of the plurality of fixing parts includes a contact plug that electrically interconnects the semiconductor substrate and the pad to each other.

4. The pad structure of claim 2 , further comprising an insulating film disposed between the semiconductor substrate and the pad.

5. The pad structure of claim 4 , wherein the contact plug is formed within the insulating film.

6. The pad structure of claim 5 , further comprising a buffer metal pattern array that includes a plurality of buffer metal patterns, each disposed between the semiconductor substrate and the insulating film.

7. The pad structure of claim 6 , wherein each of the plurality of fixing parts is configured to electrically interconnect the buffer metal pattern with the pad.

8. The pad structure claim 1 , wherein the blocking wire includes:

a dummy pattern disposed on substantially the same plane as the buffer metal pattern;

a dummy pad pattern disposed on substantially the same plane as the pad; and

a dummy plug that electrically interconnects the dummy pattern and the dummy pad pattern with each other.

9. The pad structure of claim 1 , wherein the pad has a substantially rectangular structure.

10. The pad structure of claim 9 , wherein each of the plurality of fixing parts is disposed at four corners of the pad.

11. The pad structure of claim 9 , wherein each of the plurality of fixing parts is disposed along two opposing sides of the pad.

12. The pad structure of claim 1 , wherein each of the plurality of fixing parts is disposed along four sides of the pad.

13. A pad structure of a semiconductor integrated circuit apparatus, comprising:

a semiconductor substrate upon which circuit patterns forming a device are disposed;

an insulating film formed on the circuit patterns of the semiconductor substrate;

a pad formed on an upper part of the insulating film and having a substantially rectangular structure;

a buffer metal pattern array disposed between the semiconductor substrate and the insulating film, the buffer metal pattern includes a plurality of buffer metal patterns overlapping the pad;

a plurality of contact plugs disposed along outer side edges of the pad to electrically interconnect and fix the pad and the plurality of buffer metal patterns;

a signal line disposed on at least one side of the pad; and

a blocking wire disposed between the signal line and the pad to prevent signal crosstalk.

14. The pad structure of claim 13 , wherein each of the plurality of contact plugs is disposed at four corners of the pad.

15. The pad structure of claim 13 , wherein each of the plurality of contact plugs is disposed along opposing sides of the pad.

16. The pad structure of claim 13 , wherein each of the plurality of contact plugs is disposed along four sides of the pad.

17. The pad structure of claim 13 , wherein the blocking wire includes:

a dummy pattern disposed on substantially the same plane as the buffer metal pattern;

a dummy pad pattern disposed on substantially the same plane as the pad; and

a dummy plug electrically interconnecting the dummy pattern and the dummy pad pattern with each other.

Assignments (4)
CORRECTIVE ASSIGNMENT TO CORRECT THE ASSIGNEE IS HYNIX SEMICONDUCTOR INC. NOT HYNIX-SEMICONDUCTOR INC. THERE IS NO HYPHEN IN THE NAME. PREVIOUSLY RECORDED ON REEL 67328 FRAME 814. ASSIGNOR(S) HEREBY CONFIRMS THE CHANGE OF NAME. Recorded May 14, 2024
From: HYNIX SEMICONDUCTOR INC.
To: SK HYNIX INC.
Reel/Frame 067412/0482 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 9, 2024
From: SK HYNIX INC.
To: MIMIRIP LLC
Reel/Frame 067369/0832 →
CHANGE OF NAME Recorded May 6, 2024
From: HYNIX-SEMICONDUCTOR INC.
To: SK HYNIX INC.
Reel/Frame 067328/0814 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 16, 2008
From: CHI, SUNG-SOO
To: HYNIX SEMICONDUCTOR, INC.
Reel/Frame 021989/0986 →