Field-emitter-based memory array with phase-change storage devices
View Patent ↗Embodiments of the present invention include systems and methods for three-terminal field-emitter triode devices, and memory arrays utilizing the same. In other embodiments, the field-emitter devices include a volume-change material, capable of changing a measurable electrical property of the devices, and/or three-dimensional memory arrays of the same.
1. An electronic device comprising:
a substrate comprising a dielectric material;
a plurality of recesses disposed within the substrate;
a bottom conductor disposed at a bottom portion of each recess;
a top conductor disposed at a top portion of each recess and electrically connected to an emitter disposed within each recess; and
a middle conductor disposed in a middle portion of at least one recess, the middle conductor separated from the emitter by a gap.
2. The electronic device of claim 1 wherein the bottom conductor comprises a plurality of generally parallel bottom conductive elements, the top conductor comprises a plurality of generally parallel top conductive elements, and the top conductors are substantially non-parallel to the bottom conductors.
3. The electronic device of claim 1 further comprising a coating over at least a portion of the bottom conductor, the coating comprising at least one of a high work-function material or a phase-change material.
4. The electronic device of claim 1 wherein the substrate comprises silicon dioxide, the bottom conductor comprises tungsten or gold, each emitter comprises molybdenum, and the top conductor comprises tungsten or gold.
5. A method for forming an electronic device, the method comprising:
forming a plurality of generally parallel bottom conductors on a substrate;
forming a layered structure over the plurality of bottom conductors, the layered structure comprising a middle conductor;
forming a plurality of recesses in the layered structure, thereby exposing a portion of a bottom conductor in each recess;
forming an emitter material within each recess; and
forming a plurality of generally parallel top conductors over the plurality of recesses, the top conductors being substantially non-parallel to the bottom conductors,
wherein the emitter material, a bottom conductor, and a top conductor forms a field emitter within each recess.
6. The method of claim 5 wherein the field emitter is a diode or a triode.
7. The method of claim 5 wherein a first field emitter is a diode and a second field emitter is a triode.
8. The method of claim 5 wherein a first field emitter has four or more terminals.
9. The method of claim 5 wherein the layered structure comprises or consists essentially of a dielectric film.
10. The method of claim 5 further comprising:
before forming the emitter material within each recess, forming a spacer material proximate an inner surface of each recess; and
after forming the emitter material within each recess, removing the spacer material from each recess.
11. The method of claim 10 wherein the layered structure comprises silicon dioxide, the spacer material comprises silicon nitride, each bottom conductor comprises at least one of tungsten and gold, the emitter material comprises molybdenum, and each top conductor comprises at least one of tungsten and gold.
12. The method of claim 10 further comprising, before forming the plurality of top conductors, removing portions of the spacer material and the emitter material disposed over the layered structure between the recesses.
13. The method of claim 12 wherein portions of the spacer material and the emitter material are removed by planarization.
14. The method of claim 5 , wherein forming the layered structure comprises:
forming a first dielectric film over the plurality of bottom conductors;
forming the middle conductor over the first dielectric film; and
forming a second dielectric film over the middle conductor and the first dielectric film.
15. The method of claim 14 wherein at least one recess intersects the middle conductor.
16. The method of claim 15 wherein at least one recess intersects only the first and second dielectric films.
17. The method of claim 5 further comprising encapsulating the plurality of recesses.
18. The method of claim 5 further comprising a coating disposed above at least one bottom conductor, the coating comprising at least one of a high work-function material and a phase-change material.