Process for fabricating crown capacitors of dram and capacitor structure

1. A process for fabricating crown capacitors of DRAM, comprising:

providing a substrate having a template layer thereon;

forming a patterned support layer over the template layer;

forming a sacrifice layer over the substrate covering the patterned support layer;

forming a plurality of holes through the sacrifice layer, the patterned support layer and the template layer, wherein the patterned support layer is located at a depth at which bowing of sidewalls of the holes occurs and is bowed less than the sacrifice layer at the sidewalls;

forming, a substantially conformal conductive layer over the substrate; and

dividing the conductive layer into a plurality of lower electrodes of the crown capacitors.

2. The process of claim 1 , wherein the step of dividing the conductive layer into the lower electrodes comprises:

forming a sealing layer over the substrate to seal the holes;

removing a portion of the sealing layer and a portion of the conductive layer to expose the sacrifice layer; and

removing the remaining sealing layer, the sacrifice layer and the template layer.

3. The process of claim 2 , wherein the step of removing a portion of the sealing layer and a portion of the conductive layer comprises a dry etching step.

4. The process of claim 2 , wherein the step of removing a portion of the sealing layer and a portion of the conductive layer comprises a CMP step.

5. The process of claim 2 , wherein the step of removing the remaining sealing layer, the sacrifice layer and the template layer comprises a wet etching step.

6. The process of claim 1 , wherein the step of dividing the conductive layer into the lower electrodes comprises:

forming a sealing layer over the substrate to seal the holes;

removing the sealing layer, a portion of the conductive layer on the sacrifice layer and a portion of the sacrifice layer to expose the support layer; and

removing the remaining sacrifice layer and the template layer.

7. The process of claim 6 , wherein the step of removing the sealing layer, a portion of the conductive layer on the sacrifice layer and a portion of the sacrifice layer comprises a dry etching step.

8. The process of claim 6 , wherein the step of removing the sealing layer, a portion of the conductive layer on the sacrifice layer and a portion of the sacrifice layer comprises a CMP step.

9. The process of claim 6 , wherein the step of removing the remaining sacrifice layer and the template layer comprises a wet etching step.

10. The process of claim 1 , wherein the step of forming the patterned support layer over the template layer comprises:

forming a blanket support layer over the template layer; and

patterning the blanket support layer by etching.

11. The process of claim 1 , further comprising adjusting respective positions of the holes to increase a distance between two opposite top edges of any two neighboring holes not above the patterned support layer.

12. The process of claim 11 , wherein

the patterned support layer comprises a plurality of parallel linear patterns,

the holes are arranged along first sides of the linear patterns, and

adjusting respective positions of the holes comprises shifting each hole toward a second side of the corresponding linear pattern.

13. The process of claim 11 , wherein

the patterned support layer comprises a plurality of parallel linear patterns,

the holes are arranged along two sides of each linear pattern,

the holes arranged along two sides of a linear pattern are arranged at the two sides of the linear pattern alternately,

the holes arranged along two opposite sides of two neighboring linear patterns are arranged at the two opposite sides of the two linear patterns alternatively, and

adjusting respective positions of the holes comprises shifting each hole at a first side of a linear pattern toward a second side of the linear pattern and shifting each hole at the second side of a linear pattern toward the first side of the linear pattern.

14. The process of claim 1 , further comprising shrinking a top edge of each hole not above the patterned support layer to increase a distance between opposite top edges of any two neighboring holes not over the patterned support layer.

15. A capacitor structure for DRAM with crown capacitors, comprising:

a plurality of lower electrodes of the crown capacitors disposed on a substrate, wherein a top of each of the lower electrodes forms a closed ring in one plane; and

a support layer disposed between the lower electrodes and at a height of upper portions of the lower electrodes, with an empty space between the support layer and the substrate,

wherein each of the lower electrodes has a bowing portion at a sidewall thereof, a top of the support layer is lower than the top of each of the lower electrodes, and the support layer is disposed at a height of the bowing portion of the sidewall.

16. The capacitor structure of claim 15 , wherein the support layer comprises a plurality of parallel linear patterns or a plurality of elliptic patterns.

17. The capacitor structure of claim 16 , wherein

the support layer comprises a plurality of parallel linear patterns,

the lower electrodes are arranged along two sides of each linear pattern,

the lower electrodes arranged along two sides of a linear pattern are arranged at the two sides of the linear pattern alternately, and

the lower electrodes arranged along two opposite sides of any two neighboring linear patterns are arranged at the two opposite sides of the two linear patterns alternatively.

18. The capacitor structure of claim 16 , wherein

the support layer comprises a plurality of parallel linear patterns, and

the lower electrodes are arranged along first sides of the linear patterns but not along second sides of the linear patterns.