Methods for enhancing photolithography patterning
View Patent ↗A method for fabricating a semiconductor device that includes: providing a substrate prepared with a photoresist layer; providing a photomask comprising a first and a second pattern having a respective first and second pitch range; providing a composite aperture comprising a first and a second off-axis illumination aperture pattern, the first off-axis aperture pattern having a configuration that improves the process window of the first pitch range and the second off-axis aperture pattern having a configuration that improves the process window for a second pitch range; exposing the photoresist layer on the substrate with radiation from an exposure source through the composite aperture and the photomask; and developing the photoresist layer to pattern the photoresist layer.
1. A method for fabricating a semiconductor device comprising:
providing a substrate prepared with a photoresist layer;
providing a photomask comprising a first and a second pattern having a respective first and second pitch range;
providing a composite aperture comprising first and second off-axis illumination (OAI) components, the first and second OAI components having respective first and second OAI aperture pattern, the first off-axis illumination aperture pattern having a configuration that reduces forbidden pitch effect of the first pitch range and the second off-axis illumination aperture pattern having a configuration that reduces forbidden pitch of the second pitch range;
exposing the photoresist layer on the substrate with radiation from a radiation source through the composite aperture and the photomask; and
developing the photoresist layer to pattern the photoresist layer.
2. The method as claimed in claim 1 , wherein the first and second off-axis illumination aperture patterns belong to the same off-axis illumination mode.
3. The method as claimed in claim 2 , wherein the first off-axis illumination aperture pattern comprises openings that are of a different thickness from openings associated with the second off-axis illumination aperture pattern.
4. The method as claimed in claim 3 , wherein thickness of the off-axis illumination aperture pattern openings is denoted by difference between partial coherence values of an inner and outer circumference of the openings.
5. The method as claimed in claim 2 , wherein the first and second off-axis illumination aperture patterns are oriented at an angle with respect to each other.
6. The method as claimed in claim 2 , wherein at least one of the first and second off-axis illumination aperture pattern belongs to an annular, dipole, quasar or quadrupole illumination mode.
7. The method as claimed in claim 1 , wherein the first off-axis illumination aperture pattern comprises openings that are of a different thickness from openings associated with the second off-axis illumination aperture pattern.
8. The method as claimed in claim 1 , wherein at least one of the first and second off-axis illumination aperture pattern belongs to an annular, dipole, quasar or quadrupole illumination mode.
9. The method as claimed in claim 1 , wherein the process window is defined by at least one of depth of focus, exposure latitude, and image contrast or weighted combinations thereof.
10. The method as claimed in claim 1 , wherein during photoresist exposure, radiation from the exposure source is sufficient to cause a total phase change in the entire thickness of the photoresist layer, wherein the first and second pattern is transferred onto the photoresist layer in a single exposure step.
11. The method as claimed in claim 1 , wherein the first and second patterns comprise line and space features.
12. The method as claimed in claim 1 , wherein the first and second patterns comprise openings.
13. The method as claimed in claim 1 , wherein the semiconductor device comprises an integrated circuit.
14. A method for fabricating a semiconductor device comprising:
providing a substrate prepared with a photoresist layer;
providing a photomask comprising first and second patterns having a respective first and second pitch range;
providing an aperture comprising first and second illumination components having respective first and second illumination aperture pattern, wherein the first and second illumination aperture patterns belong to the same illumination mode, the first illumination aperture pattern further having a configuration that reduces the forbidden pitch effect of the first pitch range and the second illumination aperture pattern having a configuration that reduces the forbidden pitch effect of the second pitch range;
exposing the photoresist layer on the substrate with radiation from a radiation source through the aperture and the photomask; and
developing the photoresist layer to pattern the photoresist layer.
15. The method as claimed in claim 14 , wherein the first illumination aperture pattern comprises openings that are of a different thickness from openings associated with the second illumination aperture pattern.
16. The method as claimed in claim 15 , wherein thickness of the illumination aperture pattern openings is denoted by difference between partial coherence values of an inner and outer circumference of the openings.
17. The method as claimed in claim 14 , wherein at least one of the first and second illumination aperture pattern belongs to an annular, dipole, quasar or quadrupole illumination mode.