Inspection apparatus and an inspection method for inspecting a circuit pattern
View Patent ↗A circuit-pattern inspection apparatus and related method provide a highly sensitive defect inspection of an area including the most circumferential portion of a memory mat of a semiconductor chip formed on a semiconductor wafer. In certain examples, an image of a circuit pattern of a die formed on the semiconductor wafer is acquired to judge whether or not the circuit pattern contains a defect.
1. A circuit-pattern inspection apparatus that acquires an image of a circuit pattern of a die formed on a semiconductor wafer to judge whether or not the circuit pattern has a defect, the apparatus comprising:
a plurality of image memories, each of which stores data of the image distributed on the basis of the repeatability of the circuit pattern;
a plurality of processor elements that determine a direction of the repeatability of the circuit pattern, wherein each processor element compares the image data stored in a respective one of the image memories with a reference image generated by adding and averaging in the direction of the repeatability to generate a difference image, and judges whether an area, in which a difference value of the difference image is larger than a predetermined threshold value, is a defect; and
an information integration unit for integrating and outputting a plurality of pieces of defect information, the defect information including image data judged to be defective by one of the processor elements and coordinates indicative of the defect.
2. A circuit-pattern inspection apparatus that acquires an image of a circuit pattern of a die formed on a semiconductor wafer to judge whether or not the circuit pattern has a defect, the apparatus comprising:
a plurality of image memories, each of which stores data of the image distributed on the basis of the repeatability of the circuit pattern;
a plurality of processor elements, wherein each processor element compares the image data stored in a respective one of the image memories with a reference image combined by adding and averaging in a direction of the repeatability to generate a difference image, and judges that an area in which a difference value of the difference image is larger than a predetermined threshold value is a defect; and
an information integration unit for integrating and outputting a plurality of pieces of defect information, the defect information including image data judged to be defective by one of the processor elements and coordinates indicative of the defect, wherein:
when a memory cell is judged to be defective in a corner portion of a rectangular area of a memory mat having a plurality of memory cells in the circuit pattern of the die, one of the processor elements does not treat the memory cell as a defect,
the reference image is at least an image of a different memory mat or an image of a different die, and
a target area where a defect is detected is the whole surface of the memory mat including each corner portion of the rectangular area of the memory mat.
3. A circuit-pattern inspection method in which an image of a circuit pattern of a die formed on a semiconductor wafer is acquired to judge whether or not the circuit pattern has a defect, the method comprising steps of:
on the basis of the repeatability of the circuit pattern, distributing data of the image to a plurality of image memories and storing the data therein;
determining a direction of repeatability of the circuit pattern;
comparing the image data stored in each of the image memories with a reference image generated by adding and averaging in the direction of the repeatability to generate a difference image;
judging that an area in which a difference value of the difference image is larger than a predetermined threshold value is a defect; and
integrating and outputting a plurality of pieces of defect information, the defect information including image data judged to be defective and coordinates indicative of the defect.
4. A circuit-pattern inspection method in which an image of a circuit pattern of a die formed on a semiconductor wafer is acquired to judge whether or not the circuit pattern has a defect, the method comprising steps of:
on the basis of the repeatability of the circuit pattern, distributing data of the image to a plurality of image memories and storing the data therein;
comparing the image data stored in each of the image memories with a reference image combined by adding and averaging in a direction of the repeatability to generate a difference image;
judging that an area in which a difference value of the difference image is larger than a predetermined threshold value is a defect; and
integrating and outputting a plurality of pieces of defect information, the defect information including image data judged to be defective and coordinates indicative of the defect, wherein:
when a memory cell is judged to be defective in a corner portion of a rectangular area of a memory mat having a plurality of memory cells in the circuit pattern of the die, the memory cell is not treated as a defect,
the reference image is at least an image of a different memory mat or an image of a different die, and
a target area where the defect is detected is the whole surface of the memory mat including each corner portion of the rectangular area of the memory mat.