Semiconductor memory device and method of fabricating the same
View Patent ↗The present invention discloses a method of fabricating a semiconductor memory device including forming sequentially a gate insulating layer and a first conductive pattern on a semiconductor substrate; forming a protective layer on surfaces of the first conductive pattern and the gate insulating layer; performing an etching process to form a trench, the etching process being performed such that the protective layer remains on side walls of the first conductive pattern to form a protective pattern; forming an isolation layer in the trench; etching the isolation layer; removing the protective pattern above a surface of the isolation layer; and forming sequentially a dielectric layer and a second conductive layer on surfaces of the isolation layer, the protective pattern and the first conductive pattern.
1. A semiconductor memory device, comprising
a semiconductor substrate having a plurality of trenches;
gate insulating patterns formed on the semiconductor substrate between the plurality of trenches;
floating gates having side walls formed on the gate insulating patterns, wherein a width of the floating gates is narrower than a width of the gate insulating patterns;
a nitride layer formed on the side walls of the floating gates, wherein a height of the nitride layer is lower than a height of the floating gates;
isolation layers formed in the plurality of trenches, wherein a height of an edge of the isolation layers is the same as a height of the nitride layer;
a dielectric layer formed on a surface of the nitride layer, the isolation layers, and the floating gates; and
a control gate formed on the dielectric layer.
2. The semiconductor memory device of claim 1 , wherein the floating gates are configured such that the sum of the width of the floating gates and a width of the nitride layer is the same as the width of the gate insulating patterns.
3. The semiconductor memory device of claim 1 , wherein a central portion of an upper portion of the isolation layers formed in the trenches is located below an edge portion of an upper portion of the isolation layers formed in the trenches.