IP Library Granted Patent US 8,545,716
Granted Patent B2
US 8,545,716 · App. 12/438,143 · Granted Oct 1, 2013

Etching liquid composition

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Quick Facts
Patent No.
US 8,545,716
App. No.
12/438,143
Granted
Oct 1, 2013
Kind
B2
Abstract

A metal film such as an aluminum film or an aluminum alloy film is etched with good controllability, preventing a resist from bleeding, to have a proper taper configuration and superior flatness. A water solution containing a phosphoric acid, a nitric acid, and an organic acid salt is used as an etching liquid composition used to etch the metal film on a substrate. The organic acid salt is composed of one kind selected from a group consisting of an aliphatic monocarboxylic acid, an aliphatic polycarboxylic acid, an aliphatic oxicarboxylic acid, an aromatic monocarboxylic acid, an aromatic polycarboxylic acid and an aromatic oxycarboxylic acid, and one kind selected from a group consisting of an ammonium salt, an amine salt, a quaternary ammonium salt, and an alkali metal salt. In addition, a concentration of the organic acid salt ranges from 0.1% to 20% by weight. In addition, the etching liquid composition according to the present invention is used when the metal film is formed of aluminum or an aluminum alloy.

Claims (8)

1. An etching liquid composition capable of etching a metal film on a substrate, said etching liquid composition being

a water solution consisting of phosphoric acid, nitric acid, and an organic acid salt, wherein:

the concentration of said phosphoric acid in said etching liquid composition is 30% to 80% by weight;

the concentration of said nitric acid in said etching liquid composition is 1% to 40% by weight;

the concentration of said organic acid salt in said etching liquid composition is 0.1% to 20% by weight; and

the total concentration of said phosphoric acid, nitric acid, organic acid salt and water in said etching liquid composition is 100% by weight, wherein

an organic acid of said organic acid salt is one member selected from the group consisting of an aliphatic monocarboxylic acid, an aliphatic polycarboxylic acid, an aliphatic oxycarboxylic acid, an aromatic monocarboxylic acid, an aromatic polycarboxylic acid, and an aromatic oxycarboxylic acid, and wherein a salt of said organic acid salt is one member selected from the group consisting of an ammonium salt, an amine salt, a quaternary ammonium salt, and an alkali metal salt.

2. The etching liquid composition according to claim 1 , capable of etching an aluminum or aluminum alloy.

Assignments (13)
RELEASE OF SECURITY INTEREST IN PATENTS RECORDED AT REEL 038620, FRAME 0087 Recorded Jun 22, 2023
From: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
To: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC; FAIRCHILD SEMICONDUCTOR CORPORATION
Reel/Frame 064070/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE INCORRECT PATENT NUMBER 5859768 AND TO RECITE COLLATERAL AGENT ROLE OF RECEIVING PARTY IN THE SECURITY INTEREST PREVIOUSLY RECORDED ON REEL 038620 FRAME 0087. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY INTEREST. Recorded Aug 25, 2016
From: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
To: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
Reel/Frame 039853/0001 →
PARTIAL RELEASE OF SECURITY INTEREST IN PATENTS RECORDED AT REEL 038620 FRAME 0087 Recorded Jun 14, 2016
From: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
To: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
Reel/Frame 038991/0888 →
CHANGE OF NAME Recorded May 10, 2016
From: SANYO SEMICONDUCTOR MANUFACTURING CO., LTD.
To: ON SEMICONDUCTOR NIIGATA CO., LTD.
Reel/Frame 038658/0547 →
SECURITY INTEREST Recorded Apr 15, 2016
From: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
To: DEUTSCHE BANK AG NEW YORK BRANCH
Reel/Frame 038620/0087 →
CORRECTIVE ASSIGNMENT TO CORRECT THE APPLICATION NUMBERS . PREVIOUSLY RECORDED ON REEL 034285 FRAME 0006. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Jan 9, 2015
From: SANYO SEMICONDUCTOR CO., LTD.
To: SYSTEM SOLUTIONS CO., LTD.
Reel/Frame 034745/0927 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 17, 2014
From: SANYO ELECTRIC CO., LTD.
To: SYSTEM SOLUTIONS CO., LTD
Reel/Frame 034531/0046 →
CORRECTIVE ASSIGNMENT TO CORRECT THE INCORRECT PATENT NUMBER LISTED ON THE NAME CHANGE USP 7619299 PREVIOUSLY RECORDED ON REEL 025762, FRAME 0635 Recorded Jun 6, 2011
From: NIGATA SANYO ELECTRIC CO., LTD.
To: SANYO SEMICONDUCTOR MANUFACTURING CO., LTD.
Reel/Frame 026424/0676 →
CORRECTIVE ASSIGNMENT TO CORRECT THE INCORRECT PATENT NUMBER 7619299, PREVIOUSLY RECORDED ON REEL 025762 FRAME 0320.ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT Recorded Jun 2, 2011
From: SANYO SEMICONDUCTOR MANUFACTURING CO., LTD.
To: NIGATA SANYO ELECTRIC CO., LTD.
Reel/Frame 026654/0343 →
COMPANY SPLIT Recorded Dec 22, 2010
From: SANYO SEMICONDUCTOR MANUFACTURING CO., LTD.
To: NIGATA SANYO ELECTRIC CO., LTD.
Reel/Frame 025762/0320 →
CHANGE OF NAME Recorded Dec 22, 2010
From: NIGATA SANYO ELECTRIC CO., LTD.
To: SANYO SEMICONDUCTOR MANUFACTURING CO., LTD.
Reel/Frame 025762/0635 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 20, 2009
From: TAGO, TSUGUHIRO
To: SANYO SEMICONDUCTOR MANUFACTURING CO., LTD.
Reel/Frame 022291/0707 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 20, 2009
From: MATSUDA, TOMOTAKE; KIMURA, MAYUMI; AOYAMA, TETSUO
To: HAYASHI PURE CHEMICAL IND, LTD.
Reel/Frame 022291/0741 →