Inductively coupled coil and inductively coupled plasma device using the same
The present invention discloses an inductively coupled coil and an inductively coupled plasma device using the same. The inductively coupled coil comprises an internal coil and an exterior coil which are respective from each other and coaxially arranged, internal coil comprising a plurality of internal respective branches having the same configurations which are nested together, the plurality of internal respective branches being arranged symmetrically with respect to an axis of the inductively coupled coil; the external coil comprising a plurality of external respective branches having the same configurations which are nested together, the plurality of external respective branches being arranged symmetrically with respect to the axis of the inductively coupled coil. The inductively coupled coil is located on the reaction chamber of the inductively coupled plasma device and is connected to a RF source. It can make the plasma distribute uniformly on the wafer in the reaction chamber so that the difference in chemical reaction rate on the surface of the wafer is small and the quality of the etched wafer is improved. They can be applied in a semiconductor wafer manufacturing apparatus, and they can also be adapted to other apparatuses.
1. An inductively coupled coil, comprising: an internal coil and an external coil which are distinct from each other and coaxially arranged with respect to each other,
the internal coil comprising a plurality of distinct internal branches having a same configuration which are nested together, the plurality of distinct internal branches being electrically connected in parallel and arranged symmetrically with respect to an axis of the inductively coupled coil, the configuration of the distinct internal branches including a radius from a point on each distinct internal branch to the axis, and currents flowing through the distinct internal branches being of a same direction;
the external coil comprising a plurality of distinct external branches having a same configuration which are nested together, the plurality of distinct external branches being electrically connected in parallel and arranged symmetrically with respect to the axis of the inductively coupled coil, the configuration of the distinct external branches including a radius from a point on each distinct external branch to the axis, and currents flowing through the distinct external branches being of the same direction;
an input end of each internal branch and each external branch being connected to an RF (radio frequency) source through a variable capacitor in series;
output ends of the distinct internal branches and the distinct external branches being connected to a same grounding capacitor; and
the variable capacitors and the same grounding capacitor being configured to adjust an impedance of each internal branch and each external branch and positions of maximum and minimum currents and voltages on the internal branches and the external branches.
2. The inductively coupled coil according to claim 1 , wherein each of the plurality of distinct internal branches defines a helical line.
3. The inductively coupled coil according to claim 2 , wherein each of the plurality of distinct external branches defines an Archimedes line, an involute line or a vortex line.
4. The inductively coupled coil according to claim 1 , wherein each of the plurality of distinct internal branches spirally winds upwardly along the axis thereof.
5. The inductively coupled coil according to claim 4 , wherein diameters of each of the plurality of distinct internal branches are configured substantially the same, or gradually become smaller or larger.
6. The inductively coupled coil according to claim 4 , wherein
each of the plurality of distinct internal branches ascend in equal intervals or unequal intervals.
7. The inductively coupled coil according to claim 1 , wherein
the internal coil comprises n distinct internal branches, and the external coil comprises n distinct external branches, where n is an integer not less than 2.
8. An inductively coupled plasma device, comprising:
a reaction chamber;
a dielectric window provided at a top portion of the reaction chamber; and
an inductively coupled coil that consists of an internal coil and an external coil which are distinct from each other and coaxially arranged with respect to each other, wherein (i) the internal coil comprises a plurality of distinct internal branches having a same configuration which are nested together, the plurality of distinct internal branches being electrically connected in parallel and arranged symmetrically with respect to an axis of the inductively coupled coil, the configuration of the distinct internal branches including a radius from a point on each distinct internal branch to the axis, (ii) wherein the external coil comprises a plurality of distinct external branches having a same configuration which are nested together, the plurality of distinct external branches being electrically connected in parallel and arranged symmetrically with respect to the axis of the inductively coupled coil, the configuration of the distinct external branches including a radius from a point on each distinct external branch to the axis, (iii) an input end of each internal branch and each external branch is connected to an RF source through a variable capacitor in series, (iv) currents flowing through the distinct internal branches are of a same direction, and currents flowing through the distinct external branches are of the same direction; (v) output ends of the distinct internal branches and the distinct external branches are connected to a same grounding capacitor; and (vi) the variable capacitors and the same grounding capacitor are configured to adjust an impedance of each internal branch and each external branch and positions of maximum and minimum currents and voltages on the internal branches and the external branches;
wherein the inductively coupled coil is provided on the dielectric window, and the inductively coupled coil is connected with the RF source via the match.
9. An inductively coupled plasma device, comprising:
a reaction chamber;
a dielectric window provided at a top portion of the reaction chamber; and
an inductively coupled coil that includes an internal coil and an external coil which are distinct from each other and coaxially arranged with respect to each other, wherein (i) the internal coil comprises a plurality of distinct internal branches having the same configuration which are nested together, the plurality of distinct internal branches being arranged symmetrically with respect to an axis of the inductively coupled coil, the configuration of the distinct internal branches including a radius from a point on each distinct internal branch to the axis, (ii) wherein the external coil comprises a plurality of distinct external branches having the same configuration which are nested together, the plurality of distinct external branches being arranged symmetrically with respect to the axis of the inductively coupled coil, the configuration of the distinct external branches including a radius from a point on each distinct external branch to the axis, (iii) an input end of each internal branch and each external branch is connected to a match through a variable capacitor in series, (iv) the internal coil comprises n distinct internal branches, and the external coil comprises n distinct external branches, where n is an integer not less than 2, (v) currents flowing through the distinct internal branches are of a same direction, and currents flowing through the distinct external branches are of the same direction; (vi) output ends of the distinct internal branches and the distinct external branches are connected to a same grounding capacitor; and (vii) the variable capacitors and the same grounding capacitor are configured to adjust an impedance of each internal branch and each external branch and positions of maximum and minimum currents and voltages on the internal branches and the external branches;
wherein the inductively coupled coil is provided on the dielectric window, and the inductively coupled coil is connected with an RF source via the match.
10. The inductively coupled plasma device according to claim 9 , wherein the internal and external coils of the inductively coupled coil are connected in parallel and then connected with the match.
11. The inductively coupled plasma device according claim 8 , wherein the internal and external coils of the inductively coupled coil are connected with the match respectively.
12. The inductively coupled plasma device according to claim 8 , wherein the internal and external coils of the inductively coupled coil are connected in parallel and then connected with the match.
13. The inductively coupled plasma device according to claim 9 , wherein the internal and external coils of the inductively coupled coil are connected with the match respectively.
14. An inductively coupled coil, comprising an internal coil and an external coil which are distinct from each other and coaxially arranged with respect to each other,
the internal coil comprising a plurality of distinct internal branches having the same configuration which are nested together, the plurality of distinct internal branches being electrically connected in parallel and arranged symmetrically with respect to an axis of the inductively coupled coil, the configuration of the distinct internal branches including a radius from a point on each distinct internal branch to the axis, and currents flowing through the distinct internal branches being of a same direction;
the external coil comprising a plurality of distinct external branches having the same configuration which are nested together, the plurality of distinct external branches being electrically connected in parallel and arranged symmetrically with respect to the axis of the inductively coupled coil, the configuration of the distinct external branches including a radius from a point on each distinct external branch to the axis, and currents flowing through the distinct external branches being of the same direction;
an input end of each internal branch and each external branch being connected to a match through a variable capacitor in series;
the internal coil comprising n distinct internal branches, and the external coil comprises n distinct external branches, wherein n is an integer greater than 2; and output ends of the distinct internal branches and the distinct external branches are connected to a same grounding capacitor, the variable capacitors and the same grounding capacitor being configured to adjust an impedance of each internal branch and each external branch and positions of maximum and minimum currents and voltages on the internal branches and the external branches.