Liquid crystal display device
A thin film transistor substrate of fringe field switching type and a fabricating method thereof for simplifying a process are disclosed. In the thin film transistor substrate of fringe field switching type, a gate line has a multiple-layer structure and includes a transparent conductive layer. A data line crosses the gate line to define a pixel area. A thin film transistor is connected to the gate line and the data line. A common line is provided in a multiple-layer structure and in parallel to the gate line. A common electrode is formed by an extension of a transparent conductive layer of the common line at said pixel area. A pixel electrode is connected to the thin film transistor to form a fringe field with the common electrode in the pixel area.
1. A liquid crystal display device, comprising:
a multiple-layer structure gate line having a transparent conductive layer;
a data line crossing the gate line to define a pixel area;
a thin film transistor connected to the gate line and the data line;
a common line formed in parallel to the gate line and having the multiple-layer structure;
a common electrode formed by an extension of a transparent conductive layer of the common line in the pixel area; and
a pixel electrode connected to the thin film transistor to form a fringe field with the common electrode in the pixel area.
2. The device as claimed in claim 1 , wherein a storage capacitor provided such that the common electrode overlaps with the pixel electrode with an insulating film.
3. The device as claimed in claim 1 , wherein the common electrode has a plate shape and the pixel electrode has a rib shape.
4. The device as claimed in claim 1 , wherein the pixel electrode overlaps with the common electrode with a gate insulating film between the gate line and data line and a protective film on the data line.
5. The device as claimed in claim 4 , wherein the pixel electrode is connected to a drain electrode of the thin film transistor via a contact hole passing through the protective film.
6. The device as claimed in claim 1 , wherein a semiconductor pattern extends along the data line.
7. The device as claimed in claim 1 , further comprising:
a pad connected to at least one of the gate line, the data line and the common line,
wherein the pad includes:
a lower pad electrode connected to the at least one line; and
an upper pad electrode connected to the lower pad electrode via the contact hole.
8. The device as claimed in claim 7 , wherein the lower pad electrode connected to the at least one of the common line and gate line having a multiple-layer structure.
9. The device as claimed in claim 7 , wherein the lower pad electrode connected to the data line overlaps with the semiconductor pattern extended along the data line.
10. The device as claimed in claim 1 , wherein the multiple-layer structure having the transparent conductive layer is a layer structure having the transparent conductive layer and the upper conductive layer and having step coverage taking a stepwise shape.
11. The device as claimed in claim 1 , further comprising:
a shielding pattern on the common electrode along at least one outer side of the common electrode.
12. The device as claimed in claim 1 , wherein the pixel electrode is formed on a basis of the common line.
13. The device as claimed in claim 12 , further comprising at least one shielding pattern extended, in parallel to the data line, from the common line.
14. The device as claimed in claim 12 , further comprising a shielding pattern formed along at least one outer side of the common electrode.