Mask system employing substantially circular optical proximity correction target and method of manufacture thereof
View Patent ↗A method of manufacture of a mask system includes: providing design data; generating a substantially circular optical proximity correction target from the design data; biasing a segment of the substantially circular optical proximity correction target; and generating mask data based on the shape produced by biasing the segment of the substantially circular optical proximity correction target.
1. A method of manufacture of an integrated circuit device comprising:
providing design data;
generating a substantially circular optical proximity correction target from the design data;
biasing a segment of the substantially circular optical proximity correction target by extending an arc of the substantially circular optical proximity correction target, while maintaining a dimension of a different segment within the substantially circular optical proximity correction target;
generating mask data, based on the shape produced by biasing the segment of the substantially circular optical proximity correction target, by using a computer aided design system; and
making a mask from the mask data.
2. The method as claimed in claim 1 wherein:
providing the design data includes providing a polygon shaped feature.
3. The method as claimed in claim 1 wherein:
generating the substantially circular optical proximity correction target includes generating a substantially circular shape.
4. The method as claimed in claim 1 wherein:
biasing the segment of the substantially circular optical proximity correction target includes biased forms of the segment located substantially equidistant from the other biased forms of the segment.
5. The method as claimed in claim 1 wherein:
generating the mask data includes generating a graphic data system out pattern for the mask.
6. A method of manufacture of an integrated circuit device comprising:
providing a contact hole design;
generating a substantially circular optical proximity correction target of the contact hole design;
segmenting the substantially circular optical proximity correction target;
biasing a segment of the substantially circular optical proximity correction target by extending an arc of the substantially circular optical proximity correction target, while maintaining a dimension of a different segment within the substantially circular optical proximity correction target;
generating mask data, based on the shape produced by biasing the segment of the substantially circular optical proximity correction target, by using a computer aided design system; and
making a mask from the mask data.
7. The method as claimed in claim 6 wherein:
providing the contact hole design includes providing a circular shaped feature.
8. The method as claimed in claim 6 wherein:
segmenting the substantially circular optical proximity correction target includes segmenting the substantially circular optical proximity correction target into substantially equal partitions.
9. The method as claimed in claim 6 wherein:
biasing a segment of the substantially circular optical proximity correction target includes biasing more than one of the segment.
10. The method as claimed in claim 6 wherein:
generating the mask data based on the shape produced by biasing the segment of the substantially circular optical proximity correction target helps to prevent formation of a side lobe.
11. A method of manufacture of an integrated circuit device comprising:
providing a contact hole design;
generating a substantially circular optical proximity correction target of the contact hole design;
segmenting the substantially circular optical proximity correction target;
biasing a segment of the substantially circular optical proximity correction target by extending an arc perimeter of the substantially circular optical proximity correction target in a radial direction, while maintaining a dimension of a different segment within the substantially circular optical proximity correction target;
generating mask data, based on the shape produced by biasing the segment of the substantially circular optical proximity correction target, by using a computer aided design system; and
making a mask from the mask data.
12. The method as claimed in claim 11 wherein:
providing the contact hole design includes providing a circular design.
13. The method as claimed in claim 11 wherein:
generating the substantially circular optical proximity correction target includes generating a substantially circular shape.
14. The method as claimed in claim 11 wherein:
biasing the segment of the substantially circular optical proximity correction target includes biased forms of the segment located substantially equidistant from the other biased forms of the segment.
15. The method as claimed in claim 11 wherein:
generating the mask data includes generating a graphic data system out pattern for the mask.
16. The method as claimed in claim 11 wherein:
biasing the segment of the substantially circular optical proximity correction target is done with reference to nearby features.
17. The method as claimed in claim 16 wherein:
providing the contact hole design includes providing a circular shaped feature.
18. The method as claimed in claim 16 wherein:
segmenting the substantially circular optical proximity correction target includes segmenting the substantially circular optical proximity correction target into substantially equal partitions.
19. The method as claimed in claim 16 wherein:
biasing a segment of the substantially circular optical proximity correction target includes biasing more than one of the segment.
20. The method as claimed in claim 16 wherein:
generating the mask data based on the shape produced by biasing the segment of the substantially circular optical proximity correction target helps to prevent formation of a side lobe.