Semiconductor device having non parallel cleavage planes in a substrate and supporting substrate
View Patent ↗The invention prevents a fracture parallel to a cleavage plane of a supporting substrate along a groove formed in the supporting substrate before dicing. A supporting substrate is attached to a front surface of a semiconductor substrate formed with an electronic device with an adhesive layer being interposed therebetween. In this supporting substrate, dicing lines are not parallel with cleavage planes which are perpendicular to the front surface of supporting substrate, i.e., a fifth cleavage plane and a sixth cleavage plane crossing perpendicularly thereto. A groove is then formed in the supporting substrate from the front surface to the middle thereof in the direction perpendicular to the front surface, along the dicing lines inside an opening provided in the semiconductor substrate. This groove is not parallel with the fifth cleavage plane and the sixth cleavage plane. After given processes, dicing is performed to the layered body of layers from the semiconductor substrate to the supporting substrate along the dicing lines.
1. A semiconductor device comprising:
a semiconductor substrate comprising electronic devices formed on a front surface thereof;
a supporting substrate made of a single crystal semiconductor and attached to the semiconductor substrate;
an adhesive layer attaching the supporting substrate to the semiconductor substrate;
a protection film covering a back surface and a side surface of the semiconductor substrate and covering a portion of a side surface of the supporting substrate,
wherein in plan view of the semiconductor device the side surface of the supporting substrate extends along a direction that is not parallel with a cleavage plane of the supporting substrate, and
a lateral width of the supporting substrate is greater than a lateral width of the semiconductor substrate so that the side surface of the supporting substrate defines a lateral edge of the semiconductor device.
2. A semiconductor device comprising:
a semiconductor substrate comprising electronic devices formed on a front surface thereof;
a supporting substrate made of a single crystal silicon and attached to the semiconductor substrate;
an adhesive layer attaching the supporting substrate to the semiconductor substrate;
a protection film covering a back surface and a side surface of the semiconductor substrate and covering a portion of a side surface of the supporting substrate,
wherein a front surface and a back surface of the supporting substrate correspond to a cleavage plane of the single crystal silicon,
in plan view of the semiconductor device the side surface of the supporting substrate extends along a direction that is not parallel with a cleavage plane of the single crystal silicon, and
a lateral width of the supporting substrate is greater than a lateral width of the semiconductor substrate so that the side surface of the supporting substrate defines a lateral edge of the semiconductor device.
3. The semiconductor device of claim 2 , wherein the extending direction of the side surface of the supporting substrate and one of cleavage planes makes an angle of 5 to 45 degrees in the plan view of the semiconductor device.