SYSTEM FOR SUPPLYING WATER VAPOR IN SEMICONDUCTOR WAFER TREATMENT
A system for supplying water vapor in a process for treatment of a semiconductor wafer, comprising a treatment chamber having an interior for receiving at least one semiconductor wafer and a water vapor dispenser. The water vapor dispenser comprises i) a hot water source, ii) a water vapor separator, iii) a first conduit fluidly connecting the hot water source to the water vapor separator, iii) a fluid control valve in the first conduit controlling the flow of fluid between the hot water source and the water vapor separator, and iv) a second conduit fluidly connecting the water vapor separator to the treatment chamber for delivery of water vapor to the interior of the treatment chamber.
1 . A system for supplying water vapor in a process for treatment of a semiconductor wafer, comprising
a) a treatment chamber having an interior for receiving at least one semiconductor wafer; and
b) a water vapor dispenser comprising
i) a hot water source,
ii) a water vapor separator,
iii) a first conduit fluidly connecting the hot water source to the water vapor separator,
iii) a fluid control valve in the first conduit controlling the flow of fluid between the hot water source and the water vapor separator, and
iv) a second conduit fluidly connecting the water vapor separator to the treatment chamber for delivery of water vapor to the interior of the treatment chamber.
2 . The system of claim 1 , wherein the hot water source is capable of heating water to a temperature of from boiling to superheating.
3 . The system of claim 1 , wherein the hot water source is a water heater capable of heating water to a temperature of from about 100 to about 150° C.
4 . The system of claim 1 , wherein the hot water source is a water heater configured to dispense superheated fluid having less than about 30% by volume water vapor, wherein the fluid control valve is a throttling valve configured to reduce the pressure of superheated water passing through the valve, causing a portion of the water to flash to water vapor.
5 . The system of claim 1 , wherein the hot water source is a water heater configured to dispense superheated fluid having less than about 5% by volume water vapor, wherein the fluid control valve is a throttling valve configured to reduce the pressure of superheated water passing through the valve, causing a portion of the water to flash to water vapor.
6 . The system of claim 1 , wherein the fluid control valve is a throttling valve configured to reduce the pressure of superheated water passing through the valve, causing a portion of the water to flash to steam.
7 . The system of claim 1 , wherein the water vapor separator comprises a mist eliminator.
8 . The system of claim 1 , wherein the hot water source is a water heater that is the only heating component of the water vapor dispenser.