IP Library Granted Patent US 8,269,292
Granted Patent B2
US 8,269,292 · App. 12/584,946 · Granted Sep 18, 2012

Magnetic tunnel junction (MTJ) to reduce spin transfer magnetizaton switching current

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Quick Facts
Patent No.
US 8,269,292
App. No.
12/584,946
Granted
Sep 18, 2012
Kind
B2
Abstract

A MTJ that minimizes spin-transfer magnetization switching current (Jc) in a Spin-RAM to <1×10 6 A/cm 2 is disclosed. The MTJ has a Co 60 Fe 20 B 20 /MgO/Co 60 Fe 20 B 20 configuration where the CoFeB AP1 pinned and free layers are amorphous and the crystalline MgO tunnel barrier is formed by a ROX or NOX process. The capping layer preferably is a Hf/Ru composite where the lower Hf layer serves as an excellent oxygen getter material to reduce the magnetic “dead layer” at the free layer/capping layer interface and thereby increase dR/R, and lower He and Jc. The annealing temperature is lowered to about 280° C. to give a smoother CoFeB/MgO interface and a smaller offset field than with a 350° C. annealing. In a second embodiment, the AP1 layer has a CoFeB/CoFe configuration wherein the lower CoFeB layer is amorphous and the upper CoFe layer is crystalline to further improve dR/R and lower RA to ≦10 ohm/μm 2 .

Claims (8)

1. An MTJ element for reducing spin-transfer magnetization switching current in a magnetic device, comprising:

a pinned layer having an AP2/coupling layer/AP1 configuration wherein the AP2 layer is formed on an AFM layer and the AP1 layer is a composite having a lower amorphous Co 60 Fe 20 B 20 layer having a thickness of about 12 to 18 Angstroms and an upper crystalline Co 75 Fe 25 layer with a thickness of about 5 to 7 Angstroms;

a crystalline MgO tunnel barrier formed on the crystalline CoFe layer in the composite AP1 pinned layer;

an amorphous CoFeB free layer formed on the MgO tunnel barrier;

and a capping layer formed on the CoFeB free layer wherein the capping layer is a layer of Hf or Zr to provide a high oxygen gettering capability and said layer contacts said amorphous CoFeB free layer.

2. The MTJ element of claim 1 wherein the magnetic device is a Spin-RAM.

3. The MTJ element of claim 1 wherein the AP2 portion of the pinned layer is comprised of CoFe and the coupling layer is Ru.

4. The MTJ element of claim 1 wherein the amorphous CoFeB free layer has a Co 60 Fe 20 B 20 composition.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 25, 2019
From: HEADWAY TECHNOLOGIES, INC.
To: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Reel/Frame 048692/0917 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 20, 2018
From: MAGIC TECHNOLOGIES, INC.
To: HEADWAY TECHNOLOGIES, INC.
Reel/Frame 047604/0081 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 22, 2018
From: HORNG, CHENG T.; TONG, RU-YING
To: MAGIC TECHNOLOGIES, INC.
Reel/Frame 047256/0646 →