Polishing pad manufacturing method
View Patent ↗A method for manufacturing a polishing pad prevents slurry leaks and provides a pad that can be used to provide high optical detection accuracy. The method for manufacturing a polishing pad includes forming a groove for injecting a light-transmitting region forming material on the back surface of a polishing layer; injecting the light-transmitting region forming material into the groove and curing the material to form a light-transmitting region; and buffing the front surface of the polishing layer to expose the light-transmitting region on the front surface.
1. A method for manufacturing a polishing pad, comprising the steps of:
forming a groove for injecting a light-transmitting region forming material, on a back surface of a polishing layer;
injecting the light-transmitting region forming material into the groove and curing the material to form a light-transmitting region; and
buffing a front surface of the polishing layer to expose the light-transmitting region on the front surface.
2. The method of claim 1 , wherein after the buffing, the light-transmitting region has a thickness that is 20 to 90% of the thickness of the polishing layer.