Granted Patent B2

US 7,858,487 · App. 12/614,890 · Granted Dec 28, 2010

Abstract

Claims (13)

1. A method for indicating directionality in integrated circuit manufacturing, the method comprising:

forming a first indicator within a first block of the integrated circuit to indicate a directionality of a non-visually discernable characteristic of the first block; and

performing a directionally dependent process using the first indicator to determine the directionality of the non-visually discernable characteristic of the first block.

2. A method as in claim 1 , wherein the directionally dependent process comprises an implant.

3. A method as in claim 2 , wherein the implant comprises a halo implant.

4. A method as in claim 3 , wherein the halo implant comprises a halo implant for a source region.

5. A method as in claim 1 , wherein the first indicator indicates a crystal lattice orientation.

6. A method as in claim 1 , further comprising:

forming a second indicator within a second block of the integrated circuit to indicate a directionality of the non-visually discernable characteristic of the second block;

determining if the first indicator and the second indicator indicate a same directionality; and

if the first indicator and the second indicator do not indicate the same directionality, rotating the second at least one block of the integrated circuit.

7. A method as in claim 6 , wherein said rotating the second block of the integrated circuit is performed during design rule checking for the integrated circuit.

8. A method as in claim 6 , wherein said rotating the second block of the integrated circuit is performed during mask floorplanning for the integrated circuit.

Assignments (26)