IP Library Granted Patent US 8,633,053
Granted Patent B2
US 8,633,053 · App. 12/638,674 · Granted Jan 21, 2014

Photovoltaic device

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Quick Facts
Patent No.
US 8,633,053
App. No.
12/638,674
Granted
Jan 21, 2014
Kind
B2
Abstract

A photovoltaic device is described. The photovoltaic device comprises an organic-based antireflection layer. A method of making a photovoltaic device is also described.

Claims (20)

1. A method of making a photovoltaic device, comprising:

providing a substrate;

performing a diffusion process to form an emitter on a surface of the substrate;

performing a hydrogen passivation process on a front side of the emitter thereby reducing recombination losses of charge carrier pairs in the operation of the photovoltaic device, wherein the hydrogen passivation process is performed in the course of the diffusion process, wherein the diffusion process and the hydrogen passivation process are performed in the same processing chamber; and

applying an organic-based antireflection layer on the front side of the emitter;

drying the applied organic-based antireflection layer;

after drying, heating the organic-based antireflection layer;

after heating, cooling the organic-based antireflection layer;

removing portions of the organic-based antireflection layer from unwanted areas of the photovoltaic device; and

after cooling the organic-based antireflection layer, providing a glass cover over the organic-based antireflection layer such that the organic-based antireflection layer is between the glass cover and the front side of the emitter.

2. The method according to claim 1 , further comprising performing a lamination method.

3. The method according to claim 2 , wherein applying the organic-based antireflection layer is performed in the course of the lamination method.

4. The method according to claim 1 , wherein applying the organic-based antireflection layer on the front side of the emitter is performed by means of a spin-coating process.

5. The method according to claim 1 , wherein the organic-based antireflection layer comprises:

a sol-gel material.

6. The method of claim 1 , wherein the organic-based antireflection layer comprises spin-on glass.

7. The method of claim 1 , wherein the organic-based antireflection layer comprises a photo-resist material.

8. The method of claim 1 , wherein the organic-based antireflection layer comprises a nanoresist material.

9. The method of claim 1 , wherein the organic-based antireflection layer comprises an organic base material, wherein the organic base material comprises pigments that provide a high refractive index.

10. The method of claim 1 , before providing the glass cover, melting a melt or a lamination foil on the organic-based antireflection layer, wherein the glass cover is placed on the melt or lamination foil.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 9, 2015
From: INFINEON TECHNOLOGIES AG
To: POLARIS INNOVATIONS LIMITED
Reel/Frame 036575/0670 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 8, 2015
From: QIMONDA AG
To: INFINEON TECHNOLOGIES AG
Reel/Frame 035623/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 21, 2012
From: DETJE, MARTIN; MAEGE, IRIS; VOELKEL, LARS
To: QIMONDA AG
Reel/Frame 028421/0832 →