IP Library Granted Patent US 8,896,810
Granted Patent B2
US 8,896,810 · App. 12/649,212 · Granted Nov 25, 2014

Liquid immersion scanning exposure system using an immersion liquid confined within a lens hood

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Quick Facts
Patent No.
US 8,896,810
App. No.
12/649,212
Granted
Nov 25, 2014
Kind
B2
Abstract

A liquid immersion scanning exposure system utilizes an immersion liquid confined within a watertight lens hood having a base portion formed from a solid optical element. During operation, a bottom portion of a lens assembly is disposed within the immersion liquid and the solid optical element is placed upon a photoresist material or layer (to be patterned). The lens assembly moves laterally through the immersion liquid parallel to the photoresist material. Because the solid optical element separates the immersion liquid from the photoresist material and does not move relative to the photoresist material, the photoresist material does not contact with the immersion liquid and the solid optical element and is not susceptible to damage or scratching by the solid optical element.

Claims (39)

1. A liquid immersion scanning system comprising:

a watertight lens hood having a bottom portion and a plurality of wall portions defining an interior volume, wherein the bottom portion of the watertight lens hood comprises a solid optical element positioned above a top surface of a photoresist material, wherein the solid optical element is in direct contact with the to surface of the photoresist material.

2. The liquid immersion scanning system as set forth in claim 1 further comprising:

an immersion liquid within the watertight lens hood.

3. The liquid immersion scanning system as set forth in claim 2 further comprising:

a lens assembly at least partially disposed within the watertight lens hood.

4. The liquid immersion scanning system us set forth in claim 3 wherein a bottom portion of the lens assembly is disposed within the immersion liquid.

5. The liquid immersion scanning system as set forth in claim 2 wherein the solid optical element comprises optical material having an index of refraction substantially equal to an index of refraction of the immersion liquid.

6. The liquid immersion scanning system as set forth in claim 3 wherein the lens assembly moves laterally within the immersion liquid within the watertight lens hood.

7. The liquid immersion scanning system as set forth in claim 6 wherein the immersion liquid comprises at least one of: water and argon fluoride.

8. A method for operating a liquid immersion scanning system, the method comprising:

providing a watertight lens hood;

providing a solid optical element as a base of the watertight lens hood;

placing, a lens assembly within the watertight lens hood;

providing a photoresist layer;

disposing the solid optical element of the watertight lens hood above a top surface of the photoresist layer, wherein the solid optical element is in direct contact with the top surface of the photoresist layer or is in direct contact with a buffer layer in direct contact with the top surface of the photoresist layer; and

operating the lens assembly within the watertight lens hood.

9. The method as set forth in claim 8 further comprising:

placing an immersion liquid within the watertight lens hood.

10. The method as set forth in claim 9 further comprising:

placing a bottom portion of the lens assembly within the immersion liquid within the watertight lens hood.

11. The method as set forth in claim 9 wherein the solid optical element comprises optical material having an index of refraction substantially equal to an index of refraction of the immersion liquid.

12. The method as set forth in claim 9 further comprising:

moving the lens assembly laterally within the immersion liquid within the watertight lens hood.

13. The method as set forth in claim 12 wherein the immersion liquid within the watertight lens hood comprises at least one of: water and argon fluoride.

14. The method as set forth in claim 8 wherein the buffer layer comprises an anti-adhesion film.

15. A method for operating a liquid immersion scanning system, the method comprising:

providing a watertight lens hood having as bottom portion and a plurality of wall portions defining an interior volume, the bottom portion including a solid optical element positioned above a top surface of a photoresist material, wherein the solid optical element is in direct contact with top surface of the photoresist material or is in direct contact with a buffer layer in direct contact with the top surface of the photoresist material;

placing an immersion liquid within the watertight lens hood;

placing a lens assembly within the immersion liquid within the watertight lens hood; and

operating the liquid immersion scanning system by moving, the lens assembly laterally within the immersion liquid within the watertight lens hood.

16. The method as set forth in claim 15 wherein the buffer layer comprises an anti-adhesion film.

17. A liquid immersion scanning system comprising:

watertight lens hood having a bottom portion and a plurality of wall portions defining an interior volume, wherein the bottom portion of the watertight lens hood comprises a solid optical element positioned above a surface of a photoresist material, wherein the solid optical element is in direct contact with a buffer layer that is in direct contact with a top surface of the photoresist material.

18. The liquid immersion scanning system as set forth in claim 17 wherein the buffer layer comprises an anti-adhesion film.

19. The liquid immersion scanning system as set forth in claim 17 further comprising:

an immersion liquid within the watertight lens hood; and

a lens assembly at least partially disposed within the immersion liquid within the watertight lens hood.

20. The liquid immersion scanning system as set forth in claim 19 wherein the lens assembly moves laterally within the immersion liquid within the watertight lens hood.

Assignments (7)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 19, 2020
From: GLOBALFOUNDRIES SINGAPORE PTE. LTD.
To: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Reel/Frame 054600/0031 →
RELEASE OF SECURITY INTEREST Recorded Nov 19, 2020
From: WILMINGTON TRUST, NATIONAL ASSOCIATION
To: GLOBALFOUNDRIES SINGAPORE PTE. LTD.
Reel/Frame 054481/0673 →
RELEASE OF SECURITY INTEREST Recorded Nov 18, 2020
From: WILMINGTON TRUST, NATIONAL ASSOCIATION
To: GLOBALFOUNDRIES INC.
Reel/Frame 054475/0718 →
SECURITY AGREEMENT Recorded Nov 27, 2018
From: GLOBALFOUNDRIES SINGAPORE PTE. LTD.
To: WILMINGTON TRUST, NATIONAL ASSOCIATION
Reel/Frame 047660/0203 →
CHANGE OF NAME Recorded Jun 2, 2010
From: CHARTERED SEMICONDUCTOR MANUFACTURING LTD.
To: CHARTERED SEMICONDUCTOR MANUFACTURING PTE. LTD.
Reel/Frame 024476/0268 →
CHANGE OF NAME Recorded Jun 2, 2010
From: CHARTERED SEMICONDUCTOR MANUFACTURING PTE. LTD.
To: GLOBALFOUNDRIES SINGAPORE PTE. LTD.
Reel/Frame 024476/0275 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 26, 2010
From: ZHOU, WENZHAN; TAN, SIA KIM; YUAN, LEI; ZHOU, MEISHENG
To: CHARTERED SEMICONDUCTOR MANUFACTURING, LTD.
Reel/Frame 024291/0095 →