Systems and methods for drying a rotating substrate
View Patent ↗A system of drying a surface of a substrate is provided. The system includes a rotary support for supporting a substrate; and an assembly comprising a first dispenser, a second dispenser, and a third dispenser, the assembly positioned above the surface of the substrate, the second and third dispensers positioned on the assembly adjacent to and in contact with one another and spaced from the first dispenser, the second dispenser having an opening that is larger than an opening of the third dispenser, and the second dispenser being located between the first and third dispensers; and means for translating the assembly generally parallel to the surface of the substrate.
1. A system for drying a surface of a substrate comprising:
a rotary support for supporting a substrate; and
an assembly comprising a first dispenser, a second dispenser, and a third dispenser, the assembly positioned above the surface of the substrate, the second and third dispensers positioned on the assembly adjacent to and in contact with one another and spaced from the first dispenser, the second dispenser having an opening that is larger than an opening of the third dispenser, and the second dispenser being located between the first and third dispensers; and
means for translating the assembly generally parallel to the surface of the substrate.
2. The system of claim 1 wherein the opening of the second dispenser is approximately twice the size of the opening of the third dispenser.
3. The system of claim 1 further comprising:
a source of liquid operably coupled to the first dispenser; and
a source of drying fluid operably coupled to the second and third dispensers.
4. The system of claim 1 wherein the opening of the second dispenser is located at a first distance from the surface of the substrate while the opening of the third dispenser is located at a second distance from the surface of the substrate, the first distance being greater than the second distance.
5. The system of claim 1 wherein the rotary support is adapted to rotate about an axis, and wherein the opening of the second dispenser is located at a first radial distance from the axis while the opening of the third dispenser is located at a second radial distance from the axis, the first radial distance being greater than the second radial distance.
6. The system of claim 5 wherein an opening of the first dispenser is located at a third radial distance from the axis, the third radial distance being greater than the first radial distance.
7. The system of claim 1 wherein the third dispenser follows the second dispenser during translation of the assembly during a substrate drying sequence.