Patent Assignment
Reel/Frame 060201/0991
Change of Name
Recorded: 2022-05-26
Received: 2022-05-26
Pages: 5
Assignor
NAURA AKRION INC.
Executed: 2022-05-17
Assignee
AKRION TECHNOLOGIES INC.
6330 HEDGEWOOD DR., SUITE 150, ALLENTOWN, PA, 18106, UNITED STATES
Covered Properties
(43)
Correlation Between Conductivity and Ph Measurements for Koh Texturing Solutions and Additives
Application:
17/209,299 →
Correlation Between Conductivity and Ph Measurements for Koh Texturing Solutions and Additives
Application:
16/237,302 →
System, Apparatus, and Method for Processing Substrates Using Acoustic Energy
Application:
16/107,525 →
Method for Selective Under-Etching of Porous Silicon
Application:
15/240,451 →
Composite Transducer Apparatus and System for Processing a Substrate and Method of Constructing the Same
Application:
14/727,116 →
Correlation Between Conductivity and Ph Measurements for Koh Texturing Solutions and Additives
Application:
14/703,459 →
System, Apparatus, and Method for Processing Substrates Using Acoustic Energy
Application:
14/490,080 →
Systems and Methods for Drying a Rotating Substrate
Application:
14/294,742 →
Composite Transducer Apparatus and System for Processing a Substrate and Method of Constructing the Same
Application:
14/281,829 →
Method for Processing Flat Articles
Application:
13/686,697 →
Systems and Methods for Drying a Rotating Substrate
Application:
13/633,843 →
Systems and Methods for Drying a Rotating Substrate
Application:
13/296,760 →
System and Method for the Sonic-Assisted Cleaning of Substrates Utilizing a Sonic-Treated Liquid
Application:
12/445,783 →
Method of Manufacturing a Solar Cell Using a Pre-Cleaning Step That Contributes to Homogeneous Texture Morphology
Application:
12/898,374 →
Acoustic Energy System, Method and Apparatus for Processing Flat Articles
Application:
12/871,286 →
Method for Selective Under-Etching of Porous Silicon
Application:
12/716,785 →
Systems and Methods for Drying a Rotating Substrate
Application:
12/685,935 →
Composite Transducer Apparatus and System for Processing a Substrate and Method of Constructing the Same
Application:
12/266,543 →
Method for cleaning substrates utilizing surface passivation and/or oxide layer growth to protect from pitting
Application:
12/070,620 →
Method of Cleaning Substrates Utilizing Megasonic Energy
Application:
11/873,750 →
Spray Jet Cleaning Apparatus and Method
Application:
11/745,866 →
System and Method for Selective Etching of Silicon Nitride During Substrate Processing
Application:
10/585,229 →
Acoustic Energy System, Method and Apparatus for Processing Flat Articles
Application:
11/625,556 →
Systems and Methods for Drying a Rotating Substrate
Application:
11/624,445 →
Megasonic Cleaning Using Supersaturated Solution
Application:
11/595,029 →
Membrane Dryer
Application:
10/951,009 →
Process Sequence for Photoresist Stripping and/or Cleaning of Photomasks for Integrated Circuit Manufacturing
Application:
10/909,764 →
System and Method for Point-of-Use Filtration and Purification of Fluids Used in Substrate Processing
Application:
10/895,511 →
Megasonic Cleaner and Dryer
Application:
10/864,927 →
Megasonic Cleaning Using Supersaturated Cleaning Solution
Application:
10/864,929 →
Sonic-Energy Cleaner System with Gasified Fluid
Application:
10/742,214 →
Substrate Process Tank with Acoustical Source Transmission and Method of Processing Substrates
Application:
10/699,042 →
Capillary Drying of Substrates
Application:
10/358,636 →
Megasonic Cleaner and Dryer System
Application:
10/171,430 →
Stackable Process Chambers
Application:
10/171,429 →
Megasonic Cleaner and Dryer
Application:
10/171,426 →
Reciprocating Megasonic Probe
Application:
10/140,029 →
Apparatus for Treating Substrates
Application:
10/031,923 →
Chemical Concentration Control Device
Application:
10/117,725 →
Drying Vapor Generation
Application:
10/098,847 →
Cleaning and Drying Method and Apparatus
Application:
10/091,011 →
Megasonic Probe Energy Director
Application:
10/059,682 →
Megasonic Cleaner Probe System with Gasified Fluid
Application:
09/906,384 →