Membrane dryer
View Patent ↗A system, method, and apparatus for supplying a gas-liquid vapor to a process tank for performing semiconductor manufacturing. In one aspect, the invention is a method of supplying a gas-liquid vapor to a process tank comprising: supplying a gas stream through at least one hydrophobic tube; exposing the outside surface of the hydrophobic tube to a liquid so that a vapor of the liquid permeates the hydrophobic tube and enters the gas stream, forming a gas-liquid vapor inside the tube; and transporting the gas-liquid vapor to the process tank. In another aspect, the invention is an apparatus for supplying a gas-liquid vapor to a process tank comprising: at least one hydrophobic tube adapted to carry a gas; and a housing forming a chamber that surrounds the tube, the chamber adapted to receive a liquid that can permeate the tube, forming a gas-liquid vapor. In yet another aspect, the invention is a system for supplying a gas-liquid vapor to a process tank comprising: the apparatus of the present invention; gas supply means adapted to supply the gas to the tube; liquid supply means adapted to supply the liquid to the chamber; and gas-liquid transport means adapted to carry the gas-fluid vapor from the apparatus to the process tank.
1. A system for drying a wet substrate with a mixture of gas and vaporized liquid comprising:
a process tank having a wet substrate to be dried by contact with said mixture supported therein;
a gas source;
a liquid isopropyl alcohol source;
at least one hydrophobic tube fluidly connected to the gas source, the hydrophobic tube being impermeable to said liquid but permeable to the vapor of said liquid;
a housing forming a chamber that surrounds the tube, the chamber fluidly connected to the liquid source;
means for supplying the gas to the at least one hydrophobic tube from the gas source;
means for supplying the liquid to the chamber from the liquid source, a vapor of the liquid permeating the at least one hydrophobic tube and forming a mixture of the gas and vaporized liquid in the at least one hydrophobic tube; and
means for transporting said mixture from the inside of the hydrophobic tube to the wet substrate supported in the process chamber.
2. The system of claim 1 wherein the hydrophobic tube is constructed of a flouropolymer.
3. The system of claim 2 wherein the flouropolymer is selected form the group consisting PFA, PTFE, or PVDF.
4. The system of claim 1 wherein the housing is located within the process tank, the mixture being created within the process tank.
5. The system of claim 1 further comprising a transport line for transporting the mixture from the hydrophobic tube to the process tank.
6. The system of claim 1 further comprising means to control the mass flow rate of the gas through the gas supply means.
7. The system of claim 1 further comprising means to control pressure of the liquid when the liquid is in the chamber.
8. The system of claim 1 further comprising:
a concentration sensor adapted to measure the concentration ratio of the mixture;
means to adjust the concentration ratio of the mixture; and
a processor coupled to the concentration sensor and the adjustment means, the processor programmed to activate the adjustment means in response to data received from the concentration sensor to achieve a predetermined concentration ratio in the mixture.
9. The system of claim 8 wherein the adjustment means is adapted to control the mass flow rate of the gas through the gas supply means.
10. The system of claim 8 wherein the adjustment means is adapted to control pressure of the liquid in the chamber.
11. The system of claim 1 comprising a heater adapted to heat the gas prior to the gas combining with the vaporized liquid to form the mixture.
12. The system of claim 1 wherein the substrate is a semiconductor wafer.
13. The system of claim 1 comprising a plurality of the hydrophobic tubes within the chamber of the housing.
14. The system of claim 13 wherein the number of hydrophobic tubes is three.