Patent Assignment
Reel/Frame 021731/0718
SECURITY AGREEMENT
Recorded: 2008-10-27
Received: 2008-10-27
Pages: 17
Assignor
WAFER HOLDINGS, INC.
Executed: 2008-09-26
Assignee
BHC INTERIM FUNDING II, L.P.
444 MADISION AVENUE, 25TH FLOOR, NEW YORK, NY, 10022, UNITED STATES
Covered Applications
(60)
ACOUSTIC GENERATING DEVICE
App. No. 61/034,142
→
Method for cleaning substrates utilizing surface passivation and/or oxide layer growth to protect from pitting
App. No. 12/070,620
→
METHOD AND SYSTEM FOR PROCESSING A SUBSTRATE USING A COMPOSITE TRANSMITTER
App. No. 60/985,947
→
METHOD OF CLEANING SUBSTRATES UTILIZING MEGASONIC ENERGY
App. No. 11/873,750
→
SYSTEM AND METHOD FOR PROCESSING A SUBSTRATE UTILIZING A GAS STREAM FOR PARTICLE REMOVAL
App. No. 11/841,427
→
SYSTEM FOR MEGASONIC PROCESSING OF AN ARTICLE
App. No. 11/839,885
→
APPARATUS AND METHOD OF MEASURING ACOUSTICAL ENERGY APPLIED TO A SUBSTRATE
App. No. 11/837,292
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APPARATUS FOR EJECTING FLUID ONTO A SUBSTRATE AND SYSTEM AND METHOD INCORPORATING THE SAME
App. No. 11/781,835
→
COMBINATORIAL CODING/DECODING FOR ELECTRICAL COMPUTERS AND DIGITAL DATA PROCESSING SYSTEMS
App. No. 11/777,256
→
TRANSDUCER ASSEMBLY INCORPORATING A TRANSMITTER HAVING THROUGH HOLES, AND METHOD AND SYSTEM FOR CLEANING A SUBSTRATE UTILIZING THE SAME
App. No. 11/777,252
→
APPARATUS AND METHOD FOR PROCESSING A HYDROPHOBIC SURFACE OF A SUBSTRATE
App. No. 11/755,619
→
SPRAY JET CLEANING APPARATUS AND METHOD
App. No. 11/745,866
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SYSTEM AND METHOD FOR SELECTIVE ETCHING OF SILICON NITRIDE DURING SUBSTRATE PROCESSING
App. No. 10/585,229
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SYSTEM APPARATUS AND METHODS FOR PROCESSING SUBSTRATES USING ACOUSTIC ENERGY
App. No. 11/625,651
→
ACOUSTIC ENERGY SYSTEM, METHOD AND APPARATUS FOR PROCESSING FLAT ARTICLES
App. No. 11/625,556
→
SYSTEMS AND METHODS FOR DRYING A ROTATING SUBSTRATE
App. No. 11/624,445
→
Process sequence for photoresist stripping and cleaning of photomasks for integrated circuit manufacturing
App. No. 11/649,535
→
Reciprocating megasonic probe
App. No. 11/640,718
→
MEGASONIC CLEANING USING SUPERSATURATED SOLUTION
App. No. 11/595,029
→
System and method of cleaning substrates using a subambient process solution
App. No. 11/544,802
→
System and method of processing substrates using sonic energy having cavitation control
App. No. 11/454,447
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APPARATUS FOR MEGASONIC PROCESSING OF AN ARTICLE
App. No. 11/386,634
→
TRANSDUCER ASSEMBLY FOR MAGASONIC PROCESSING OF AN ARTICLE AND APPARATUS UTILIZING THE SAME
App. No. 11/375,907
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MEMBRANE DRYER
App. No. 10/951,009
→
PROCESS SEQUENCE FOR PHOTORESIST STRIPPING AND/OR CLEANING OF PHOTOMASKS FOR INTEGRATED CIRCUIT MANUFACTURING
App. No. 10/909,764
→
SYSTEM AND METHOD FOR POINT-OF-USE FILTRATION AND PURIFICATION OF FLUIDS USED IN SUBSTRATE PROCESSING
App. No. 10/895,511
→
MEGASONIC CLEANER AND DRYER
App. No. 10/864,927
→
MEGASONIC CLEANING USING SUPERSATURATED CLEANING SOLUTION
App. No. 10/864,929
→
APPARATUS AND METHODS FOR REDUCING DAMAGE TO SUBSTRATES DURING MEGASONIC CLEANING PROCESSES
App. No. 10/760,596
→
SONIC-ENERGY CLEANER SYSTEM WITH GASIFIED FLUID
App. No. 10/742,214
→
METHOD OF CLEANING A SIDE OF A THIN FLAT SUBSTRATE BY APPLYING SONIC ENERGY TO THE OPPOSITE SIDE OF THE SUBSTRATE
App. No. 10/726,774
→
SUBSTRATE PROCESS TANK WITH ACOUSTICAL SOURCE TRANSMISSION AND METHOD OF PROCESSING SUBSTRATES
App. No. 10/699,042
→
METHOD FOR REMOVAL OF PHOTORESIST USING SPARGER
App. No. 10/634,440
→
PROCESS AND APPARATUS FOR REMOVAL OF PHOTORESIST FROM SEMICONDUCTOR WAFERS USING SPRAY NOZZLES
App. No. 10/366,054
→
CAPILLARY DRYING OF SUBSTRATES
App. No. 10/358,636
→
MEGASONIC CLEANING SYSTEM WITH BUFFERED CAVITATION METHOD
App. No. 10/341,425
→
METHOD OF PROCESSING SUBSTRATES USING PRESSURIZED MIST GENERATION
App. No. 10/304,583
→
WAFER CLEANING
App. No. 10/243,463
→
WAFER CLEANING
App. No. 10/243,486
→
MEGASONIC CLEANER AND DRYER SYSTEM
App. No. 10/171,430
→
STACKABLE PROCESS CHAMBERS
App. No. 10/171,429
→
MEGASONIC CLEANER AND DRYER
App. No. 10/171,426
→
RECIPROCATING MEGASONIC PROBE
App. No. 10/140,029
→
DEVICE AND METHOD FOR CLEANING SUBSTRATES
App. No. 10/111,332
→
NEXTGEN WET PROCESS TANK
App. No. 10/117,778
→
MEMBRANE DRYER
App. No. 10/117,739
→
CHEMICAL CONCENTRATION CONTROL DEVICE
App. No. 10/117,725
→
PROCESS TANK WITH PRESSURIZED MIST GENERATION
App. No. 10/117,768
→
DRYING VAPOR GENERATION
App. No. 10/098,847
→
CLEANING AND DRYING METHOD AND APPARATUS
App. No. 10/091,011
→
DUMP DOOR
App. No. 10/085,565
→
MEGASONIC PROBE ENERGY DIRECTOR
App. No. 10/059,682
→
METHOD AND SYSTEM FOR CHEMICAL INJECTION IN SILICON WAFER PROCESSING
App. No. 10/053,364
→
LOW PROFILE WAFER CARRIER
App. No. 10/053,449
→
SYSTEM FOR REMOVAL OF PHOTORESIST USING SPARGER
App. No. 10/052,823
→
DEVICE AND METHOD FOR PROCESSING SUBSTRATES
App. No. 09/869,213
→
WAFER CLEANING METHOD
App. No. 09/953,504
→
MEGASONIC PROBE ENERGY ATTENUATOR
App. No. 09/922,509
→
MEGASONIC CLEANER PROBE SYSTEM WITH GASIFIED FLUID
App. No. 09/906,384
→
COILED TUBING WELLBORE CLEANOUT
App. No. 09/799,990
→