IP Library Patent Application 12711431
Patent Application
App. No. 12/711,431

CHROMIUM-FREE PASSIVATION OF VAPOR DEPOSITED ALUMINUM SURFACES

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Quick Facts
Patent No.
US None
App. No.
12/711,431
Abstract

A process for passivating a vapor-deposited aluminum layer on a substrate, including providing a substrate comprising vapor deposited aluminum on a surface thereof; treating the surface of the substrate with an aqueous substantially chromium-free composition comprising a hexafluorozirconate; and rinsing the treated surface with water. A process for passivating a vapor-deposited aluminum layer on a substrate, including vapor depositing a layer of aluminum on a substrate; treating the substrate with the vapor deposited aluminum with an aqueous substantially chromium-free composition comprising a hexafluorozirconate; and rinsing the treated substrate with water.

Claims (26)

1 . A process for passivating a vapor-deposited aluminum layer on a substrate, comprising:

providing a substrate comprising vapor deposited aluminum on a surface thereof;

treating the surface of the substrate with an aqueous substantially chromium-free composition comprising a hexafluorozirconate; and

rinsing the treated surface with water.

2 . The process of claim 1 wherein the chromium-free composition comprising a hexafluorozirconate further comprises a magnesium salt, a nickel salt, a zinc salt or a combination of any two or more of a magnesium salt, a nickel salt and a zinc salt.

3 . The process of claim 1 wherein the vapor deposited aluminum is applied to the surface by decomposition of a metal-containing precursor having a decomposition temperature in a surrounding atmosphere, in which the substrate is maintained at a temperature greater than the decomposition temperature of the precursor while the surrounding atmosphere is maintained at a temperature lower than the decomposition temperature of the precursor.

4 . The process of claim 1 wherein the vapor deposited aluminum is applied to the surface by one or a combination of two or more of chemical vapor deposition, ion vapor deposition and physical vapor deposition.

5 . The process of claim 1 wherein the substrate comprises a ferrous metal on which the aluminum is vapor deposited.

6 . The process of claim 5 wherein the ferrous metal is steel.

7 . The process of claim 1 wherein the aqueous chromium-free composition is free of added zinc ions.

8 . The process of claim 1 wherein the aqueous chromium-free composition is free of added alkali metal ions.

9 . The process of claim 1 further comprising depositing at least one additional layer over the treated layer of aluminum, wherein the additional layer comprises one or more of a metal layer or an organic coating.

10 . The process of claim 1 wherein the hexafluorozirconate is provided as one or a mixture of any two or more of hexafluorozirconic acid, ammonium hexafluorozirconate, a quaternary ammonium hexafluorozirconate, an alkali metal hexafluorozirconate, an alkaline earth metal hexafluorozirconate, or a transition metal hexafluorozirconate.

11 . A process for passivating a vapor-deposited aluminum layer on a substrate, comprising:

vapor depositing a layer of aluminum on a substrate;

treating the substrate with the vapor deposited aluminum with an aqueous substantially chromium-free composition comprising a hexafluorozirconate; and

rinsing the treated substrate with water.

12 . The process of claim 11 wherein the chromium-free composition comprising a hexafluorozirconate further comprises a magnesium salt, a nickel salt, a zinc salt or a combination of any two or more of a magnesium salt, a nickel salt and a zinc salt.

13 . The process of claim 11 wherein the vapor depositing is by decomposition of a metal-containing precursor having a decomposition temperature in a surrounding atmosphere, in which the substrate is maintained at a temperature greater than the decomposition temperature of the precursor while the surrounding atmosphere is maintained at a temperature lower than the decomposition temperature of the precursor.

14 . The process of claim 11 wherein the vapor depositing is by one or a combination of two or more of chemical vapor deposition, ion vapor deposition and physical vapor deposition.

15 . The process of claim 11 wherein the substrate comprises a ferrous metal.

16 . The process of claim 15 wherein the ferrous metal is steel.

17 . The process of claim 11 wherein the aqueous chromium-free composition is free of added zinc ions.

18 . The process of claim 11 wherein the aqueous chromium-free composition is free of added alkali metal ions.

19 . The process of claim 11 further comprising depositing at least one additional layer over the treated layer of aluminum, wherein the additional layer comprises one or more of a metal layer or an organic coating.

20 . The process of claim 11 wherein the hexafluorozirconate is provided as one or a mixture of any two or more of hexafluorozirconic acid, ammonium hexafluorozirconate, a quaternary ammonium hexafluorozirconate, an alkali metal hexafluorozirconate, an alkaline earth metal hexafluorozirconate, or a transition metal hexafluorozirconate.

Assignments (3)
RELEASE OF SECURITY INTEREST Recorded Mar 18, 2021
From: BARCLAYS BANK PLC, AS COLLATERAL AGENT
To: ATOTECH DEUTSCHLAND GMBH; ATOTECH USA, LLC
Reel/Frame 055653/0714 →
SECURITY INTEREST Recorded Feb 1, 2017
From: ATOTECH DEUTSCHLAND GMBH; ATOTECH USA INC
To: BARCLAYS BANK PLC, AS COLLATERAL AGENT
Reel/Frame 041590/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 24, 2010
From: WILES, JACOB GRANT; KOCHILLA, JOHN R.
To: ATOTECH DEUTSCHLAND GMBH
Reel/Frame 023982/0478 →