SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR
Provided are a substrate processing apparatus and a method of manufacturing a semiconductor device which can prevent a sealing member from being deteriorated due to a thermal radiation from a heater. The substrate processing apparatus includes a processing container, a substrate stage installed in the processing container, on which a substrate is placed, a heater installed in the substrate stage and configured to heat the substrate, a thermal radiation attenuator adjacent to the processing container, and a gas supply pipe connected to a gas inlet part with a sealing member interposed therebetween and configured to supply a processing gas to an inside of the processing container, wherein the thermal radiation attenuator is installed on a line connecting the heater and the sealing member.
1 . A substrate processing apparatus comprising:
a processing container;
a substrate stage installed in the processing container, on which a substrate is placed;
a heater installed in the substrate stage and configured to heat the substrate;
a thermal radiation attenuator adjacent to the processing container; and
a gas supply pipe connected to a gas inlet part with a sealing member interposed therebetween and configured to supply a processing gas to an inside of the processing container,
wherein the thermal radiation attenuator is installed on a line connecting the heater and the sealing member.
2 . The substrate processing apparatus of claim 1 , wherein the thermal radiation attenuator is made of white glass.
3 . A method of manufacturing a semiconductor device comprising:
loading a substrate to a processing container and placing the substrate on a substrate stage;
heating the substrate by using a heater installed in the substrate stage;
processing the substrate by supplying a processing gas to the processing container via a thermal radiation attenuator, which is connected to a processing gas supply pipe with a sealing member disposed therebetween and is installed on a line the substrate stage and the sealing member; and
unloading the substrate from a processing chamber.