IP Library Granted Patent US 8,063,490
Granted Patent B2
US 8,063,490 · App. 12/729,608 · Granted Nov 22, 2011

Semiconductor device including semiconductor constituent

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Quick Facts
Patent No.
US 8,063,490
App. No.
12/729,608
Granted
Nov 22, 2011
Kind
B2
Abstract

A semiconductor device includes a semiconductor constituent having a semiconductor substrate and a plurality of electrodes for external connection provided under the semiconductor substrate. An under-layer insulating film is provided under and around the semiconductor constituent. A plurality of under-layer wires are provided under the under-layer insulating film and electrically connected to the electrodes for external connection of the semiconductor constituent. An insulating layer is provided around the semiconductor constituent and on the under-layer insulating film. A frame-like insulating substrate is embedded in an upper surface of the insulating layer and positioned around the semiconductor constituent. A plurality of upper-layer wires are provided on the insulating substrate. A base plate on which the semiconductor constituent and the insulating layer are mounted is removed.

Claims (25)

1. A semiconductor device comprising:

a semiconductor constituent having a semiconductor substrate and a plurality of electrodes for external connection provided under the semiconductor substrate;

an under-layer insulating film provided under and around the semiconductor constituent;

a plurality of under-layer wires provided under the under-layer insulating film and electrically connected to the electrodes for external connection of the semiconductor constituent;

an insulating layer provided around the semiconductor constituent on the under-layer insulating film;

a frame-like insulating substrate embedded in an upper surface of the insulating layer and positioned around the semiconductor constituent;

a plurality of upper-layer wires provided on the insulating substrate; and

a conductive layer provided on an upper surface of the insulating substrate and having a ground potential.

2. The semiconductor device according to claim 1 , wherein the semiconductor constituent is bonded to the under-layer insulating film via an adhesive layer.

3. The semiconductor device according to claim 1 , further comprising an intermediate under-layer wire provided under an under surface of the insulating substrate and electrically connected to each of the under-layer wires and the upper-layer wires.

4. The semiconductor device according to claim 1 , wherein the under-layer insulating film and the insulating layer have through holes, and

wherein vertical conductive portions are positioned in the through holes and electrically connect the under-layer wires to the upper-layer wires.

5. The semiconductor device according to claim 1 , further comprising an upper-layer overcoat film provided on an upper surface of the semiconductor substrate of the semiconductor constituent.

6. The semiconductor device according to claim 1 , further comprising:

a thermally conductive layer provided on an upper surface of the semiconductor substrate of the semiconductor constituent; and

a heat release member provided on an upper surface of the thermally conductive layer.

7. The semiconductor device according to claim 1 , further comprising a chip component provided on the under-layer insulating film around the semiconductor constituent and electrically connected to the under-layer wire.

8. The semiconductor device according to claim 1 , further comprising an under-layer overcoat film provided under the under-layer wires and the under-layer insulating film and having an opening in a portion corresponding to a connection pad portion of the under-layer wires.

9. The semiconductor device according to claim 8 , further comprising a solder layer provided in and under the opening of the under-layer overcoat film and electrically connected to the connection pad portion of the under-layer wires.

10. The semiconductor device according to claim 1 , wherein the under-layer wires and the upper-layer wires each have a multilayered structure.

11. The semiconductor device according to claim 1 , wherein the semiconductor constituent has a sealing film provided around the electrodes for external connection under the semiconductor substrate.

12. The semiconductor device according to claim 1 , wherein the semiconductor constituent has an adhesive layer provided around the electrodes for external connection under the semiconductor substrate.

13. The semiconductor device according to claim 1 , further comprising an additional conductive layer provided on an upper surface of the semiconductor substrate, the additional conductive layer being electrically connected to the conductive layer provided on the upper surface of the insulating substrate.

14. The semiconductor device according to claim 13 , wherein the additional conductive layer is a part of the upper-layer wires located on a side of the semiconductor constituent.

15. The semiconductor device according to claim 13 , wherein the additional conductive layer covers the upper surface of the semiconductor substrate.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 27, 2017
From: TERA PROBE, INC.
To: AOI ELECTRONICS CO., LTD.
Reel/Frame 041521/0001 →
MERGER Recorded Jan 27, 2017
From: TERAMIKROS, INC.
To: TERA PROBE, INC.
Reel/Frame 041664/0471 →
CHANGE OF OWNERSHIP BY CORPORATE SEPARATION-TO CORRECT ASSIGNEE'S ADDRESS ON REEL 027520/FRAME 0401 Recorded Jan 13, 2012
From: CASIO COMPUTER CO., LTD.
To: TERAMIKROS, INC.
Reel/Frame 027546/0390 →
CHANGE OF OWNERSHIP BY CORPORATE SEPARATION Recorded Jan 3, 2012
From: CASIO COMPUTER CO., LTD.
To: TERAMIKROS, INC.
Reel/Frame 027520/0401 →