Coating compositions for use with an overcoated photoresist
View Patent ↗Cyanurate compositions are provided that are particularly useful as a reagent to form a resin component of a coating composition underlying an overcoated photoresist. Preferred isocyanurates compound comprise substitution of multiple cyanurate nitrogen ring atoms by at least two distinct carboxy and/or carboxy ester groups.
1. A cyanuarate compound corresponding to the following Formula I:
wherein at least two of the radicals R 1 OOC(CX 2 ) n —, R 2 — and R 3 OOC(CX 2 ) n — are different acid or ester groups; and
R 1 , R 2 and R 3 and each X are each independently hydrogen or non-hydrogen substituents; and
n and m the same or different and are each a whole number, and
wherein the compound has halogen substitution.
2. A cyanuarate compound of claim 1 wherein the compound corresponds to the following Formula IA:
wherein at least two of the radicals R 1 OOC(CH 2 ) n —, R 2 — and R 3 OOC(CH 2 ) n — are different acid or ester groups; and
R 1 , R 2 and R 3 are each independently hydrogen or non-hydrogen substituents; and n and m the same or different and are each a whole number.
3. A compound of claim 1 wherein the compound has fluorine substitution.
4. An antireflective composition for use with an overcoated photoresist composition, the antireflective composition comprising a resin that comprises a compound of claim 1 .
5. A coated substrate comprising:
a layer of an antireflective composition of claim 4 ;
a photoresist layer over the coating composition layer.
6. A method of forming a photoresist relief image, comprising:
applying an antireflective coating composition of claim 4 on a substrate;
applying a photoresist composition above the coating composition layer; and
exposing and developing the photoresist layer to provide a resist relief image.
7. The method of claim 6 wherein the antireflective composition is crosslinked prior to applying the photoresist composition.
8. An antireflective composition for use with an overcoated photoresist composition, the antireflective composition comprising a resin that comprises a compound of claim 3 .
9. A method of forming a photoresist relief image, comprising:
applying an antireflective coating composition of claim 8 on a substrate;
applying a photoresist composition above the coating composition layer; and
exposing and developing the photoresist layer to provide a resist relief image.
10. The method of claim 9 wherein the antireflective composition is crosslinked prior to applying the photoresist composition.