IP Library › Granted Patent US 8,338,077
Granted Patent B2
US 8,338,077 · App. 12/820,331 · Granted Dec 25, 2012

Photoacid generators and photoresists comprising same

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Quick Facts
Patent No.
US 8,338,077
App. No.
12/820,331
Granted
Dec 25, 2012
Kind
B2
Abstract

This invention relates to new photoacid generator compounds and photoresist compositions that comprise such compounds. In particular, the invention relates to photoacid generator compounds that comprise a multi cyclic lactone moiety.

Claims (5)

1. A chemically-amplified positive photoresist composition comprising:

a resin binder and a photoacid generator compound selected from one of the following compounds:

2. A method for forming a photoresist relief image on a substrate comprising:

(a) applying a coating layer of a photoresist composition of claim 1 on a substrate; and

(b) exposing the coating layer to patterned activating radiation and developing the exposed coating layer to provide a relief image.

Assignments (3)
SECURITY INTEREST Recorded Nov 3, 2025
From: QNITY ELECTRONICS, INC.
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 073515/0243 →
SECURITY INTEREST Recorded Nov 3, 2025
From: QNITY ELECTRONICS, INC.
To: U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
Reel/Frame 073517/0298 →
CHANGE OF NAME Recorded Oct 29, 2024
From: ROHM & HAAS ELECTRONIC MATERIALS LLC
To: DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC
Reel/Frame 069272/0383 →