Semiconductor and solar wafers
View Patent ↗A silicon-on-insulator or bonded wafer includes an upper portion having a trapezoid shape in cross-section and a lower portion having an outer peripheral edge having a curved shape.
1. A silicon-on-insulator wafer including a first wafer and a second wafer, the silicon-on-insulator wafer comprising: an upper portion including the first wafer and a portion of the second wafer, the upper portion having an angled outer peripheral edge defining a trapezoid shape in cross-section of the upper portion; and a lower portion including the second wafer and having a curved outer peripheral edge defining a curved shape in cross-section of the lower portion, wherein a bottom surface of the upper portion coincides with a top surface of the lower portion.
2. The silicon-on-insulator wafer of claim 1 wherein the silicon-on-insulator wafer includes an active wafer as the first wafer and a substrate wafer as the second wafer.
3. The silicon-on-insulator wafer of claim 2 wherein the active wafer and substrate wafer are both made of silicon.
4. The silicon-on-insulator wafer of claim 2 wherein the upper portion is substantially coincident with the active wafer and a portion of the substrate wafer.
5. The silicon-on-insulator wafer of claim 4 wherein the upper portion includes an upper peripheral edge of the substrate wafer, the trapezoid shape defined at its lowermost portion by the upper peripheral edge of the substrate wafer.
6. The silicon-on-insulator wafer of claim 5 further comprising an oxide layer disposed between the active wafer and the substrate wafer.
7. The silicon-on-insulator wafer of claim 2 wherein the substrate wafer has only a partially trapezoid shape in cross-section, a remainder of the cross-section of the substrate wafer having the curved shape.
8. A silicon-on-insulator structure comprising: an active wafer having a peripheral edge defining a trapezoidal cross-sectional shape of the active wafer; and a substrate wafer having an upper peripheral edge that has a trapezoid shape in cross-section and an outer peripheral edge having a curved shape, the active wafer and a trapezoidal-shaped portion of the substrate wafer forming an upper portion and a curved-shaped portion of the substrate wafer forming a lower portion, wherein a bottom surface of the upper portion coincides with a top surface of the lower portion.
9. The silicon-on-insulator structure of claim 8 wherein the active wafer and substrate wafer are both made of silicon.
10. The silicon-on-insulator structure of claim 8 wherein the upper peripheral edge of the substrate wafer is substantially co-planar with the peripheral edge of the active wafer to define a lowermost portion of a trapezoid shape of the silicon-on-insulator structure.
11. The silicon-on-insulator structure of claim 10 wherein the upper portion is substantially coincident with the active wafer.
12. The silicon-on-insulator structure of claim 11 wherein the upper portion includes an upper peripheral edge of the substrate wafer, the trapezoid shape of the silicon-on-insulator structure defined at its lowermost portion by the upper peripheral edge of the substrate wafer.
13. The silicon-on-insulator structure of claim 12 further comprising an oxide layer disposed between the active wafer and the substrate wafer.
14. The silicon-on-insulator structure of claim 13 wherein the substrate wafer has only a partially trapezoid shape in cross-section, a remainder of the cross-section of the substrate wafer having the curved shape.
15. A bonded semiconductor wafer comprising an active wafer and a substrate wafer bonded to one another, the bonded semiconductor wafer partially having a trapezoid shape in cross-section, the active wafer including an outer peripheral edge including an angled shape such that the active wafer has the trapezoid shape in cross-section, an upper peripheral edge of the substrate wafer defining a lowermost portion of the trapezoid shape of the bonded semiconductor wafer, the trapezoid shape of the bonded semiconductor wafer defining an upper portion of the bonded semiconductor wafer, and an outer peripheral edge of the substrate wafer defining a curved cross-sectional shape of a lower portion of the bonded semiconductor wafer, wherein a bottom surface of the upper portion coincides with a top surface of the lower portion.
16. The bonded semiconductor wafer of claim 15 wherein the active wafer and substrate wafer are both made of silicon.
17. The bonded semiconductor wafer of claim 15 wherein the outer peripheral edge of the substrate wafer has a curved shape in cross-section positioned below the trapezoid shape.
18. The bonded semiconductor wafer of claim 17 wherein the upper portion of the bonded semiconductor wafer is substantially coincident with the active wafer.
19. The bonded semiconductor wafer of claim 18 further comprising an oxide layer disposed between the active wafer and the substrate wafer.