Method and apparatus for high efficiency gas dissociation in inductive couple plasma reactor

1. A baffle nozzle assembly, comprising:

an outer body defining an inner volume, wherein the outer body has a first inlet channel open to the inner volume and adapted to connect with a gas source, and the outer body has an outlet;

a cylindrical inlet baffle disposed within the inner volume and dividing the inner volume to a first volume and a second volume, wherein the first inlet channel opens near a first end of the first volume, one or more openings located near a second end of the first volume, and the one or more openings connect the first and second volume; and

an outlet baffle disposed over the outlet of the outer body, wherein the outlet baffle has one or more first through holes open to the second volume of the inner volume, and the outlet baffle redirects a gas flow from the first through holes.

2. The baffle nozzle assembly of claim 1 , wherein the outlet baffle comprises:

a blocker plate disposed over the outlet of the outer body, wherein the one or more first through holes are formed in the blocker plate;

a stem extending from the blocker plate at an opposite side of the outer body; and

a baffle plate on a distal end of the stem, wherein the baffle plate is substantially parallel to the blocker plate.

3. The baffle nozzle assembly of claim 2 , wherein the outer body has a second inlet channel open to the inner volume and adapted to connect with a gas source, the cylindrical inlet baffle further divides the inner volume to a third volume, and the second inlet channel opens to the third volume.

4. The baffle nozzle assembly of claim 3 , wherein the outlet baffle has a center gas channel formed in the stem and through the baffle plate and one or more by-pass channels connecting the center gas channel to the third volume.

5. The baffle nozzle assembly of claim 4 , wherein the center gas channel is a through hole in the outlet baffle and is in fluid communication with the second volume.

6. The baffle nozzle assembly of claim 4 , wherein the blocker plate has one or more second through holes open to the third volume.

7. The baffle nozzle assembly of claim 1 , wherein the outer body comprises sidewalls and a top defining the inner volume, and the outlet is an opening opposing the top, the cylindrical inlet baffle comprises sidewalls substantially parallel to the sidewalls of the outer body, the sidewalls of the cylindrical inlet baffle divide the inner volume to the first volume and the second volume, the first volume is defined by sidewalls of the outer body and sidewalls of the cylindrical inlet baffle, and the second volume is defined by the sidewalls of the cylindrical inlet baffle and the top of the outer body.

8. The baffle nozzle assembly of claim 7 , wherein the sidewalls of the cylindrical inlet baffle have a plurality slots formed on an upper side, and the plurality of slots and the top of the outer body form the one or more openings connecting the first volume and second volume.

9. The baffle nozzle assembly of claim 7 , wherein the inner volume is substantially cylindrical, and the cylindrical inlet baffle is a cylindrical side wall having spiral groves formed on outer side, the spiral groves allow vortex flow in the first volume.

10. A substrate processing system, comprising:

a chamber body defining a processing volume, wherein the chamber body comprises:

sidewalls; and

a lid, wherein the lid has a center opening adapted to introduce processing gas to the processing volume;

a first solenoidal coil antenna disposed outside the chamber body over the lid, wherein the first solenoidal coil antenna forms an inner antenna volume and is coaxial to the center opening; and

a baffle nozzle assembly coupled to the central opening of lid and partially disposed in the inner antenna volume, wherein the baffle nozzle assembly comprises:

a chamber extension disposed over the lid covering the central opening of the lid, wherein the chamber extension is disposed in the inner antenna volume, the chamber extension defines an extension volume in fluid communication with the processing volume through the central opening of the lid, the chamber extension has a first inlet channel open to the extension volume and adapted to connect with a gas source;

a cylindrical gas baffle nozzle disposed within the extension volume and dividing the extension volume to a first volume and a second volume, wherein the first inlet channel opens near a first end of the first volume, one or more openings located near a second end of the first volume, and the one or more openings connect the first and second volume; and

a plasma baffle disposed in the central opening of the lid, wherein the plasma baffle has one or more first through holes open to the second volume of the extension volume, and the plasma baffle redirects a gas flow from the first through holes.

11. The substrate processing system of claim 10 , wherein the plasma baffle comprises:

a blocker plate disposed in the center opening of the lid, wherein the one or more first through holes are formed in the blocker plate;

a stem extending from the blocker plate towards the processing volume; and

a baffle plate on a distal end of the stem, wherein the baffle plate is substantially parallel to the blocker plate.

12. The substrate processing system of claim 11 , the chamber extension has a second inlet channel open to the extension volume and adapted to connect with a gas source, the cylindrical gas baffle nozzle further divides the extension volume to a third volume, and the second inlet channel opens to the third volume.

13. The substrate processing system of claim 12 , wherein the plasma baffle has a center gas channel formed in the stem and the baffle plate, the center gas channel opens to the processing volume, and the blocker plate has one or more by-pass channels formed therein and connecting the center gas channel to the third volume.

14. The substrate processing system of claim 10 , wherein the first solenoidal antenna comprises one or more conductors wound as a spiral and the inner antenna volume is substantially cylindrical.