SEMICONDUCTOR DEVICE WITH A 7F2 CELL STRUCTURE
A semiconductor device with a 7F 2 cell structure. In one embodiment, a bit line pitch of about 2√{square root over (3)}F and a word line pitch of about 2F may be configured for the semiconductor device. In one embodiment, each of the active areas of the semiconductor device may be rotated around a corresponding center region to be offset from a corresponding bit line region. A plurality of imaginary equal lateral triangles may be formed by connecting center regions located on adjacent bit line regions and by connecting adjacent center regions located on the same bit line region. In this manner, the active areas for the semiconductor device can be arranged in a close compact pile mode within the cell plane, thereby achieving better cell area utilization. The semiconductor device may be a dynamic random access memory (DRAM).
1 . A semiconductor device comprising:
a semiconductor substrate comprising a memory array region;
a plurality of bit line regions provided on one or more portions of the memory array region, each of the bit line regions being arranged in a continuous stripe manner from 1 through N, where N is an integer corresponding to a number of rows;
a bit line pitch characterizing the plurality of bit line regions;
a plurality of word line regions provided on one or more portions of the memory array region, each of the word line regions being arranged in a continuous stripe manner, the plurality of word line regions being arranged in an orthogonal manner relative to the plurality of the bit line regions to form an array configuration;
a word line pitch characterizing the plurality of word line regions;
a plurality of active area regions, each active area region having a length and a width, each active area region corresponding to at least two memory cell regions, each active area region having a corresponding center region located on a corresponding bit line region; and
a plurality of imaginary equal lateral triangles formed by connecting the center regions located on adjacent bit line regions and by connecting adjacent center regions located on the same bit line region.
2 . The semiconductor device of claim 1 , wherein the bit line pitch is about 1.7 times the word line pitch.
3 . The semiconductor device of claim 1 , wherein each active area region is rotated about the corresponding center region to be off-set from the corresponding bit line region.
4 . The semiconductor device of claim 3 , wherein the off-set is 30 degrees counter-clockwise from the corresponding bit line region.
5 . The semiconductor device of claim 3 , wherein the off-set is 30 degrees clockwise from the corresponding bit line region.
6 . The semiconductor device of claim 1 , wherein the bit line pitch is about 2√{square root over (3)}F.
7 . The semiconductor device of claim 1 , wherein the word line pitch is about 2F.
8 . The semiconductor device of claim 1 , wherein the semiconductor device includes one or more 7F 2 memory cells.
9 . The semiconductor device of claim 1 , wherein the semiconductor device is a dynamic random access memory (DRAM).
10 . The semiconductor device of claim 1 , wherein the active area regions are in close compact pile mode, thereby achieving better cell area utilization for the semiconductor device.