Memory including a selector switch on a variable resistance memory cell
View Patent ↗Embodiments include but are not limited to apparatuses and systems including memory having a memory cell including a variable resistance memory layer, and a selector switch in direct contact with the memory cell, and configured to facilitate access to the memory cell. Other embodiments may be described and claimed.
1. A method comprising:
forming a memory cell including a variable resistance memory layer disposed between electrode layers, wherein the electrode layers are carbon layers;
forming a semiconductor-oxide-based, non-silicon selector switch in direct contact with the memory cell at a temperature of less than 150° C.;
providing a sealing layer in contact with the memory cell and the semiconductor-oxide-based, non-silicon selector switch;
providing a plurality of dielectric layers at least partially surrounding the memory cell, the semiconductor-oxide-based, non-silicon selector switch, and the at least one sealing layer, the plurality of dielectric layers in direct contact with at least the memory cell and the at least one sealing layer, wherein the sealing layer separates two adjacent dielectric layers of the plurality of dielectric layers;
providing a first conductive plug on the at least one sealing layer, the first conductive plug configured to allow electrical access between the semiconductor-oxide-based, non-silicon selector switch and a word line;
providing a first diffusion barrier layer at least partially surrounding the first conductive plug;
providing a second conductive plug on the memory cell, the second conductive plug configured to allow electrical access between the memory cell and a bit line; and
providing a second diffusion barrier layer at least partially surrounding the second conductive plug.
2. The method of claim 1 , wherein the forming the semiconductor-oxide-based selector switch comprises:
forming a zinc oxide layer on the memory cell; and
forming a contact layer on the zinc oxide layer;
wherein the contact layer comprises silver, platinum, carbon, aluminum, titanium, or nickel.
3. The method of claim 1 , wherein forming the memory cell comprises:
forming a plurality of memory cells arranged in an array of a plurality of columns and a plurality of rows;
forming a plurality of bit lines and a plurality of word lines, wherein each memory cell in a column is coupled to each other by a corresponding bit line, and
wherein each memory cell in a row is coupled to each other by a corresponding word line.
4. The method of claim 1 , wherein the semiconductor-oxide-based, non-silicon selector switch comprises a semiconductor oxide having a deposition temperature below a melting temperature of the variable resistance memory layer.
5. The method of claim 1 , wherein the semiconductor-oxide-based, non-silicon selector switch comprises a zinc oxide layer.
6. The method of claim 5 , wherein the semiconductor-oxide-based, non-silicon selector switch further comprises a contact layer on the zinc oxide layer, and wherein the zinc oxide layer is disposed between the contact layer and the memory cell, and wherein the contact layer comprises silver, platinum, carbon, aluminum, titanium, or nickel.
7. The method of claim 1 , wherein the selector switch comprises a p-type zinc oxide layer and an n-type zinc oxide layer, and wherein the selector switch further comprises a first contact layer and a second contact layer, and wherein the p-type zinc oxide layer and the n-type zinc oxide layer are disposed between the first contact layer and the second contact layer.
8. The method of claim 7 , wherein at least one of the first contact layer and the second contact layer comprises silver, platinum, carbon, aluminum, titanium, nickel, gold, or aluminum.
9. The method of claim 8 , wherein the first contact layer comprises silver and the second contact layer comprises a titanium/gold alloy.
10. The method of claim 1 , wherein the variable resistance memory layer comprises an organic material selected from the group including a self assembled mono-layer, an organic-metal-organic complex, or bulk organic semiconductor having single molecules, oligomers, or polymers.
11. The method of claim 1 , wherein the variable resistance memory layer comprises a chalcogenide.
12. The method of claim 1 , wherein the formed memory cell is part of a plurality of memory cells arranged in an array of a plurality of columns and a plurality of rows, wherein the apparatus further comprises a plurality of bit lines and a plurality of word lines, wherein each memory cell in a column is coupled to each other by a corresponding bit line, and wherein each memory cell in a row is coupled to each other by a corresponding word line.
13. The method of claim 12 , wherein the plurality of memory cells and the at least one selector switch form a crossbar memory array.
14. The method of claim 1 , wherein the selector switch is configured to selectively couple the memory cell to an output terminal of the memory device.
15. A memory cell formed from the method of claim 1 .
16. A flash memory device comprising the memory cell of claim 15 .
17. The method of claim 1 , wherein the first and second conductive plugs comprise tungsten.