Cholate photoacid generators and photoresists comprising same
View Patent ↗New photoacid generator compounds (“PAGs”) are provided that comprise a cholate moiety and photoresist compositions that comprise such PAG compounds.
1. A photoacid generator compound represented by a structure:
wherein M + represents a cation group, and the definition of the group R, m and n are defined directly below the structure.
2. A photoacid generator compound selected from:
3. A photoresist composition comprising a resin component and a photoacid generator compound of claim 1 .
4. A photoresist composition comprising a resin component and a photoacid generator compound of claim 2 .
5. A method for forming a photoresist relief image comprising:
(a) applying a coating layer of a photoresist composition of claim 3 on a substrate;
(b) exposing the photoresist coating layer to patterned activating radiation and developing the exposed photoresist layer to provide a relief image.
6. A method for forming a photoresist relief image comprising:
(a) applying a coating layer of a photoresist composition of claim 4 on a substrate;
(b) exposing the photoresist coating layer to patterned activating radiation and developing the exposed photoresist layer to provide a relief image.