Methods for monitoring the amount of contamination imparted into semiconductor wafers during wafer processing
View Patent ↗Methods are disclosed for monitoring the amount of metal contamination imparted during wafer processing operations such as polishing and cleaning. The methods include subjecting a silicon-on-insulator structure to the semiconductor process, precipitating metal contamination in the structure and delineating the metal contaminants.
1. A method for monitoring an amount of metal contamination imparted into wafers during a semiconductor process, the method comprising:
exposing at least one silicon-on-insulator structure to the semiconductor process, the silicon-on-insulator structure comprising a handle wafer, a silicon layer, and a dielectric layer between the handle wafer and the silicon layer, the semiconductor process imparting metal contaminants in the silicon layer;
evaluating metal contamination indicators of the silicon-on-insulator structures, the evaluation including:
thermally annealing the silicon-on-insulator structure to cause the metal contaminants in the silicon layer to dissolve;
cooling the silicon-on-insulator structure to form metal precipitates in the silicon layer; and
detecting the metal precipitates, the detecting step creating pits, holes and/or cavities on the front surface of the silicon-on-insulator structure and involving directing light to the front surface of the silicon-on-insulator structure and detecting scattered reflected light;
producing a first defect map by use of the scattered reflected light;
verifying whether the amount of metal contaminants imparted into semiconductor wafers is acceptable by comparing the first defect map to a second defect map produced when the level of contamination was determined to be acceptable, the first and second defect maps being produced using substantially the same process conditions including the thermal anneal temperatures, the thermal anneal times, cooling rates and process for detecting the metal precipitates.
2. The method as set forth in claim 1 wherein the metal precipitates are detected by contacting the surface of the silicon layer with an etchant.
3. The method as set forth in claim 1 wherein the thermal annealing step occurs at a temperature from about 600° C. to about 1300° C.
4. The method as set forth in claim 1 wherein the cooling involves cooling in a range of temperatures in which the metal contaminants are relatively mobile in silicon to a final temperature at which the metal contaminants are no longer relatively mobile.
5. The method as set forth in claim 1 wherein there exists a temperature, T sat , at which the metal contaminants are supersaturated in the silicon layer and a temperature, T immobile , at which the metal contaminants are no longer mobile in silicon, the method comprising cooling the silicon-on-insulator structure from about T sat to about T immobile over a length of time, t cool , upon completion of the thermal anneal, wherein (T sat −T immobile )/t cool is less than about 7° C./sec.
6. The method as set forth in claim 1 wherein the silicon-on-insulator structure is at temperature, T anneal , upon completion of the thermal anneal and there exists a temperature, T immobile , at which metal contaminants are no longer mobile in silicon, the method comprising cooling the silicon-on-insulator structure from about T anneal to about T immobile over a length of time, t cool , upon completion of the thermal anneal, wherein (T anneal −T immobile )/t cool is less than about 7° C./sec.
7. The method as set forth in claim 1 wherein the silicon layer comprises an amount of metal contaminants, the amount of metal contaminants in the silicon layer of the silicon-on-insulator structure being less than about 10 8 atoms/cm 2 after the silicon-on-insulator structure is exposed to the semiconductor process.
8. The method as set forth in claim 1 wherein the semiconductor process is selected from a group consisting of polishing, cleaning, bond strength enhancing thermal treatment, epitaxy, oxide stripping, plasma activation, wet chemical etching, gas phase chemical etching, high temperature annealing, ion implantation and oxidation.