Photoacid generators and photoresists comprising same
View Patent ↗New methods are provided for synthesis of photoacid generator compounds (“PAGs”), new photoacid generator compounds and photoresist compositions that comprise such PAG compounds. In a particular aspect, photoacid generators that comprise 1) a SO 3 − moiety; 2) one or more fluorinated carbons; and 3) one or more of the fluorinated carbons either directly or indirectly substituted by an ester keto group.
1. A photoacid generator compound that comprises a structure of the following formula (I):
RO(C═O)(CXY) p (CF 2 ) n SO 3 − M + (I)
wherein R is hydrogen or non-hydrogen substituent;
X and Y are each independently hydrogen or a non-hydrogen substituent;
p is a positive integer;
n is a positive integer;
M+ is a counter ion.
2. A photoacid generator compound of claim 1 that comprises a structure of the following formula (II):
RO(C═O)(CH 2 ) p (CF 2 ) n SO 3 − M + (II).
3. A photoacid generator of claim 1 wherein the sum of p and n is at least four.
4. A photoacid generator of claim 1 wherein R is a carbon alicylic or heteroalicylic group.
5. A photoacid generator of claim 1 wherein M+ is a sulfonium or iodonium cation.
6. A photoacid generator compound of claim 1 wherein the photoacid generator compound comprises a structure selected from the following:
7. A photoacid generator compound of claim 1 wherein the photoacid generator compound comprises a structure selected from the following:
8. A photoresist composition comprising a resin component and a photoacid generator compound of claim 6 .
9. A method for forming a photoresist relief image comprising:
a) applying a coating layer of a photoresist composition of claim 8 on a substrate;
b) exposing the photoresist coating layer to patterned activating radiation and developing the exposed photoresist layer to provide a relief image.
10. A photoresist composition comprising a resin component and a photoacid generator compound of claim 7 .
11. A method for forming a photoresist relief image comprising:
a) applying a coating layer of a photoresist composition of claim 10 on a substrate;
b) exposing the photoresist coating layer to patterned activating radiation and developing the exposed photoresist layer to provide a relief image.
12. A photoresist composition comprising a resin component and a photoacid generator compound of claim 1 .
13. A method for forming a photoresist relief image comprising:
a) applying a coating layer of a photoresist composition of claim 12 on a substrate;
b) exposing the photoresist coating layer to patterned activating radiation and developing the exposed photoresist layer to provide a relief image.