LPP EUV light source drive laser system
View Patent ↗An apparatus and method is disclosed which includes or employs an EUV light source comprising a laser device outputting a laser beam, a beam delivery system directing the laser beam to an irradiation site, and a material for interaction with the laser beam at the irradiation site to create an EUV light emitting plasma for use in processing substrates.
1. A system for generating EUV light from EUV light emitting plasma, said EUV light emitting plasma created from target droplets irradiated by laser pulses at an irradiation site in a laser produced plasma EUV system, comprising:
at least one droplet position detector configured to detect positions of a target droplet as said target droplet is released toward said irradiation site;
a target position detection feedback system coupled to receive data pertaining to said positions of said target droplet and to produce a trajectory data for said target droplet at least from said data pertaining to said positions of said target droplet;
means for producing at least one of a temporal error signal and a spatial error signal from at least one of said data pertaining to said positions of said target droplet and said trajectory data; and
means for modifying at least one of a timing, focus, and laser beam direction of said laser pulses responsive to at least one of said temporal error signal, said spatial error signal, and said trajectory data.
2. The system of claim 1 further comprising a target delivery control system coupled to receive at least one of said temporal error signal, said spatial error signal, and said trajectory data, said target delivery control system modifying target droplet release responsive to said at least one of said temporal error signal, said spatial error signal, and said trajectory data.
3. The system of claim 1 wherein said means for modifying comprises a firing control system coupled to receive at least said temporal error signal, said firing control system modifying at least timing of said laser pulses responsive to said temporal error signal.
4. The system of claim 1 wherein said means for modifying comprises a laser beam positioning system coupled to receive at least said spatial error signal, said laser beam positioning system modifying at least one of laser beam focus and laser beam direction associated with said laser pulses responsive to said spatial error signal.
5. The system of claim 1 wherein said laser pulses represent laser pulses of a CO2 drive laser.
6. The system of claim 5 wherein said laser pulses represent include at least one pre-pulse and one main pulse.
7. The system of claim 1 wherein said target droplet comprises tin.
8. The system of claim 1 further comprising a seed laser system generating a combined output pulse having a pre-pulse portion and a main pulse portion and an amplifying laser amplifying said pre-pulse portion and said main pulse portion at the same time without said pre-pulse portion saturating a gain of said amplifying laser.
9. The system of claim 8 wherein said amplifying laser comprises a CO2 laser.
10. The system of claim 1 wherein said target droplet is between about 10 microns to about 100 microns in diameter.
11. A method for generating EUV light from EUV light emitting plasma, said EUV light emitting plasma created from target droplets irradiated by laser pulses at an irradiation site in a laser produced plasma EUV method, comprising:
detecting positions of a target droplet as said target droplet is released toward said irradiation site;
generating at least one of a temporal error signal and a spatial error signal from data pertaining to said positions of said target droplet; and
modifying at least one of a timing, focus, and laser beam direction of said laser pulses responsive to at least one of said temporal error signal and said spatial error signal.
12. The method of claim 11 further comprising modifying target droplet release responsive to said at least one of said temporal error signal and said spatial error signal.
13. The method of claim 11 wherein said laser pulses represent laser pulses of a CO2 drive laser.
14. The method of claim 11 wherein said laser pulses represent include at least one pre-pulse and one main pulse.
15. The method of claim 11 wherein said target droplet comprises tin.
16. The method of claim 11 further comprising generating a combined output pulse having a pre-pulse portion and a main pulse portion and amplifying said pre-pulse portion and said main pulse portion at the same time without said pre-pulse portion saturating a gain of said amplifying laser.
17. The method of claim 16 wherein said amplifying employs a CO2 laser.
18. The method of claim 11 wherein said target droplet is between about 10 microns to about 100 microns in diameter.
19. A method for generating EUV light from EUV light emitting plasma, said EUV light emitting plasma created from target droplets irradiated by laser pulses at an irradiation site in a laser produced plasma EUV method, comprising:
detecting positions of a target droplet as said target droplet is released toward said irradiation site;
generating at least one of a temporal error signal and a spatial error signal from data pertaining to said positions of said target droplet; and
modifying target droplet release responsive to said at least one of said temporal error signal and said spatial error signal.
20. The method of claim 19 wherein said laser pulses represent laser pulses of a CO2 drive laser.
21. The method of claim 19 wherein said laser pulses represent include at least one pre-pulse and one main pulse.
22. The method of claim 19 wherein said target droplet comprises tin.
23. The method of claim 19 further comprising generating a combined output pulse having a pre-pulse portion and a main pulse portion and amplifying said pre-pulse portion and said main pulse portion at the same time without said pre-pulse portion saturating a gain of said amplifying laser.
24. The method of claim 23 wherein said amplifying employs a CO2 laser.