Semiconductor chip and semiconductor package with stack chip structure
A semiconductor chip and semiconductor package with stack chip structure include align patterns. The align patterns are formed of magnetic materials having opposite polarities on the top and bottom of the semiconductor chip. Thus, when the plurality of chips are stacked on the substrate in order for the packaging, the semiconductor chips may be exactly aligned by the magnetic force between the align patterns of the vertically stacked chips. The semiconductor package includes a plurality of stacked semiconductor chips and a filling material. Each of the stacked semiconductor chips includes a semiconductor substrate having a first surface and a second surface, wherein a circuit pattern such as a bonding pad is formed on the first surface, and a first align pattern formed on the first surface of the semiconductor substrate, wherein the first align pattern is formed of a magnetic material.
1. A semiconductor chip comprising:
a semiconductor substrate having a first surface and a second surface, wherein a circuit pattern including a bonding pad is formed on the first surface;
a first align pattern formed on the first surface of the semiconductor substrate, wherein the first align pattern is formed of a magnetic material;
a through-silicon via (TSV) passing through the semiconductor substrate; and
a scribe lane on at least one side of the semiconductor substrate, wherein the circuit pattern and the through-silicon via are not formed in the scribe lane,
wherein the first align pattern is formed in the scribed lane.
2. The semiconductor chip of claim 1 , further comprising a second align pattern formed on the second surface of the semiconductor substrate in correspondence to the first align pattern, wherein the second align pattern is formed of a magnetic material.
3. The semiconductor chip of claim 2 , wherein the first align pattern and the second align pattern have opposite polarities to each other.
4. The semiconductor chip of claim 2 , wherein the first align pattern and the second align pattern are formed in plurality and arranged symmetrically to each other.
5. A semiconductor package comprising:
a plurality of stacked semiconductor chips; and
a filling material filling a gap between the semiconductor chips, wherein each of the plurality of stacked semiconductor chips comprises:
a semiconductor substrate having a first surface and a second surface,
wherein a circuit pattern including a bonding pad is formed on the first surface; and
a first align pattern formed on the first surface of the semiconductor substrate, wherein the first align pattern is formed of a magnetic material,
wherein the filling material comprises a magnetic field shielding material.
6. The semiconductor package of claim 5 , further comprising a second align pattern formed on the second surface of each of the semiconductor chips in correspondence to the first align pattern, wherein the second align pattern is formed of a magnetic material.
7. The semiconductor package of claim 6 , wherein the first align pattern and the second align pattern of each of the semiconductor chips have opposite polarities to each other.
8. The semiconductor package of claim 5 , further comprising:
a through-silicon via (TSV) passing through the semiconductor substrate of each of the semiconductor chips.
9. The semiconductor package of claim 8 , wherein the first align pattern of each of the semiconductor chips is formed in a region where the circuit pattern and the through-silicon via are not formed.
10. The semiconductor package of claim 9 , further comprising a scribe lane on at least one side of the semiconductor substrate of each of the semiconductor chips, wherein the first align pattern is formed on the scribed lane.
11. The semiconductor package of claim 6 , further comprising an interconnection formed on the lowermost semiconductor chip among the plurality of semiconductor chips and electrically connected to the plurality of semiconductor chips.
12. The semiconductor package of claim 11 , further comprising a third align pattern formed on the semiconductor substrate in correspondence to the second align pattern of the lowermost semiconductor chip among the plurality of semiconductor chips.
13. The semiconductor package of claim 8 , further comprising:
a redistribution film formed on the second surface of the lowermost semiconductor chip among the plurality of semiconductor chips and coupled to the TSV of the lowermost semiconductor chip; and
an insulation layer exposing a portion of the redistribution film.
14. The semiconductor package of claim 13 , further comprising:
an insulation layer formed between the second surface of the lowermost semiconductor chip and the redistribution film and exposing the TSV of the lowermost semiconductor chip.
15. The semiconductor package of claim 5 , further comprising a semiconductor chip formed on the uppermost semiconductor chip among the plurality of semiconductor chips, wherein the semiconductor chip comprises a fourth align pattern corresponding to the second align pattern of the uppermost semiconductor chip.