Lithographic tool in situ clean formulations
View Patent ↗Compositions and methods of using said composition for removing polymeric materials from surfaces, preferably cleaning contaminant buildup from a lithography apparatus without total disassembly of said apparatus.
1. A composition comprising at least one organic solvent and at least one non-ionic surfactant, wherein the at least one non-ionic surfactant comprises a mixture of sorbitan ester and polysorbate surfactant and wherein the at least one organic solvent comprises a species selected from the group consisting of 3-pentanone, acetone, 5-hydroxy-2-pentanone, 4-hydroxy-4-methyl-2-pentanone, butanone, 2-methyl-2-butanone, 4-hydroxy-2-butanone, cyclopentanone, 2-pentanone, 1-phenylethanone, benzophenone, 2-hexanone, 3-hexanone, 2-heptanone, 4-heptanone, ethyl n-butyl ketone, ethyl n-amyl ketone, dicyclohexyl ketone, 2,6-dimethylcyclohexanone, 2-acetylcyclohexanone, dimethyl adipate, dimethyl succinate, diethyl phthalate, diethyl succinate, dibutyl succinate, diethyl adipate, diethyl glutarate, dibutyl phthalate, diethyl tartarate, butylene carbonate, glycerine carbonate, and combinations thereof.
2. The composition of claim 1 , wherein the pH of the composition is about 5 to about 9.
3. The composition of claim 1 , wherein the sorbitan ester comprises a species selected from the group consisting of sorbitan monolaurate, sorbitan monopalmitate, sorbitan monostearate, sorbitan tristearate, sorbitan monooleate, and sorbitan trioleate.
4. The composition of claim 1 , wherein the at least one organic solvent comprises a carbonate selected from a group consisting of butylene carbonate, glycerine carbonate, and combinations thereof.
5. The composition of claim 1 , wherein the polysorbate surfactants are selected from the group consisting of polyoxyethylene (20) sorbitan monolaurate, polyoxyethylene (20) sorbitan monopalmitate, polyoxyethylene (20) sorbitan monostearate, polyoxyethylene (20) sorbitan monooleate, polyoxyethylene sorbitan trioleate, and polyoxyethylene sorbitan tristearate.
6. The composition of claim 1 , wherein the at least one non-ionic surfactant comprises a first non-ionic surfactant having an HLB greater than 10 and a second non-ionic surfactant having an HLB less than 10.
7. The composition of claim 1 , further comprising at least one of a glycol ether, water, and a plasticizer.
8. The composition of claim 1 , wherein the composition further comprises at least one diluent to form a diluted composition, wherein the at least one diluent comprises a species selected from the group consisting of water, highly purified water, iodated organics, and composite fluids comprising nanocrystals.
9. The composition of claim 1 , wherein the composition further comprises contaminant material.
10. A method of removing contaminant material from a component of a lithographic apparatus having said contaminant material thereon, said method comprising contacting a composition with said component to remove said contaminant material from said component, wherein the composition comprises at least one organic solvent and at least one non-ionic surfactant, wherein the at least one non-ionic surfactant comprises a mixture of sorbitan ester and polysorbate surfactant, and wherein the at least one organic solvent comprises a species selected from the group consisting of 3-pentanone, acetone, 5-hydroxy-2-pentanone, 4-hydroxy-4-methyl-2-pentanone, butanone, 2-methyl-2-butanone, 4-hydroxy-2-butanone, cyclopentanone, 2-pentanone, 1-phenylethanone, benzophenone, 2-hexanone, 3-hexanone, 2-heptanone, 4-heptanone, ethyl n-butyl ketone, ethyl n-amyl ketone, dicyclohexyl ketone, 2,6-dimethylcyclohexanone, 2-acetylcyclohexanone, dimethyl adipate, dimethyl succinate, diethyl phthalate, diethyl succinate, dibutyl succinate, diethyl adipate, diethyl glutarate, dibutyl phthalate, diethyl tartarate, butylene carbonate, glycerine carbonate, and combinations thereof.
11. The composition of claim 8 , wherein the diluted composition is an emulsion, which could be generated in-situ or ex-situ by mixing with any applicable immersion liquids.
12. The method of claim 10 , wherein the pH of the composition is about 5 to about 9.
13. The method of claim 10 , wherein the at least one organic solvent comprises a carbonate selected from a group consisting of butylene carbonate, glycerine carbonate, and combinations thereof.
14. The method of claim 10 , wherein the at least one non-ionic surfactant comprises a first non-ionic surfactant having an HLB greater than 10 and a second non-ionic surfactant having an HLB less than 10.
15. The composition of claim 1 , wherein the composition is substantially devoid of any one of: abrasive material; supercritical fluids; photoresist precursors; alkaline substances; thickeners; lipids; activators; antioxidants; phosphates and phosphate-containing compounds; and surfactant compounds of the general formula R—[O-(AO) n ] m —Z.
16. A composition comprising at least one organic solvent and at least one non-ionic surfactant, wherein the at least one non-ionic surfactant comprises a surfactant selected from the group consisting of polyoxyethylene-polyoxypropylene block co-polymers, castor oil ethoxylates, fatty acid ethoxylates, alkyl ethoxylates, alkylphenyl ethoxylates, polyoxyethyleneglycol dodecyl ethers, a sucrose ester, a glycerol mono-fatty acid ester, a fatty acid ester of polyethylene glycol, a polyethoxylated sorbitan fatty acid ester, an alkylglycoside, an alkylpolyside, polyvinyl alcohols, monoglycerides, sorbitan esters, polysorbate surfactants, as well as combinations comprising at least one of the foregoing, and wherein the at least one organic solvent comprises a species selected from the group consisting of butylene carbonate, glycerine carbonate, and combinations thereof.