Patent Assignment
Reel/Frame 032815/0852
Security Interest
Recorded: 2014-05-01
Received: 2014-05-01
Pages: 80
Assignors
ADVANCED TECHNOLOGY MATERIALS, INC.
Executed: 2014-04-30
ATMI PACKAGING, INC.
Executed: 2014-04-30
ATMI, INC.
Executed: 2014-04-30
ENTEGRIS, INC.
Executed: 2014-04-30
POCO GRAPHITE, INC.
Executed: 2014-04-30
Assignee
GOLDMAN SACHS BANK USA, AS COLLATERAL AGENT
200 WEST STREET, NEW YORK, NY, 10282, UNITED STATES
Covered Properties
(100)
Wafer Carrier
Application:
14/238,693 →
Wafer Container with Particle Shield
Application:
14/115,626 →
System and Method for Detecting Air in a Fluid
Application:
14/239,737 →
Nanotube and Finely Milled Carbon Fiber Polymer Composite Compositions and Methods of Making
Application:
14/234,120 →
Method for the Recovery of Lithium Cobalt Oxide from Lithium Ion Batteries
Application:
14/127,714 →
Cobalt Precursors
Application:
61/943,494 →
Systems and Methods for Capture, Storage, and Supplying Phosphine Gas
Application:
14/240,404 →
Cmp Brush
Application:
61/942,231 →
CYCLOPENTADIENYL TITANIUM ALKOXIDES WITH OZONE ACTIVATED LIGANDS FOR ALD OF TiO2
Application:
61/939,211 →
Method and System for Controlling Operation of a Pump Based on Filter Information in a Filter Information Tag
Application:
14/175,573 →
Electrostatic Chuck and Method of Making Same
Application:
61/937,135 →
EZ Stack Individual Fluid Connectors
Application:
61/935,473 →
Post Chemical Mechanical Polishing Formulations and Method of Use
Application:
61/933,010 →
Analytical Method for the Measurement of Trace Level Acidic and Basic AMC using Liquid-Free Sample Traps
Application:
61/933,294 →
Post Chemical Mechanical Polishing Formulations and Method of Use
Application:
61/933,015 →
Alon Coated Substrate with Optional Yttria Overlayer
Application:
14/234,023 →
System and Method for Position Control of a Mechanical Piston in a Pump
Application:
14/152,866 →
Liner-Based Dispensing Systems
Application:
13/988,792 →
Formulations to Selectively Etch Silicon and Germanium
Application:
61/922,187 →
Reticle Pod
Application:
14/139,653 →
CYCLOPENTADIENYL TITANIUM ALKOXIDES WITH OZONE ACTIVATED LIGANDS FOR ALD OF TiO2
Application:
61/919,795 →
Use of Non-Oxidizing Strong Acids for the Removal of Ion-Implanted Resist
Application:
61/919,177 →
High-K Perovskite Materials and Methods of Making and Using the Same
Application:
14/128,043 →
System and Method for Providing a Smart Activity Score
Application:
14/137,734 →
Chemical Mechanical Planarization Conditioner
Application:
14/004,152 →
Ni:NiGe:Ge SELECTIVE ETCH FORMULATIONS AND METHOD OF USING SAME
Application:
61/916,543 →
Low Temperature Gst Process
Application:
14/104,984 →
Isotopically-Enriched Boron-Containing Compounds, and Methods of Making and Using Same
Application:
14/095,575 →
Carbon Monoliths for Adsorption Refrigeration and Heating Applications
Application:
61/910,072 →
Dopant Precursors for Mono-Layer Doping
Application:
61/909,459 →
Refillable Ampoule with Purge Capability
Application:
14/119,402 →
Microporous Polyamide-Imide Membranes
Application:
61/904,029 →
Nested Blow Molded Liner and Overpack and Methods of Making Same
Application:
14/001,713 →
ALD PROCESSES FOR LOW LEAKAGE CURRENT AND LOW EQUIVALENT OXIDE THICKNESS BiTaO FILMS
Application:
61/903,491 →
Device and method to measure the concentration of dissolved oxygen in liquids
Application:
61/899,605 →
Device and method to measure sub part per billion concentration of dissolved oxygen in liquids
Application:
61/898,906 →
Porous Composite Membrane Including Microporous Membrane Layers And Nanofiber Layer
Application:
14/114,868 →
Atmospheric Pressure Microwave Plasma Treated Porous Membranes
Application:
14/067,887 →
ALD PROCESSES FOR LOW LEAKAGE CURRENT AND LOW EQUIVALENT OXIDE THICKNESS BiTaO FILMS
Application:
61/895,380 →
Composition and Process for Selectively Etching Metal Nitrides
Application:
13/877,777 →
Generally Cylindrically-Shaped Liner for Use in Pressure Dispense Systems and Methods of Manufacturing the Same
Application:
13/991,641 →
Fluid Storage and Dispensing System Including Dynamic Fluid Monitoring of Fluid Storage and Dispensing Vessel
Application:
14/054,497 →
Carbon Adsorbent and Process for Separating High-Octane Components from Low-Octane Components in a Naptha Raffinate Stream Using Such Carbon Adsorbent
Application:
14/111,547 →
Purifier Cassette
Application:
14/043,620 →
Liner-Based Shipping and Dispensing Containers
Application:
14/039,847 →
Component for Solar Adsorption Refrigeration System and Method of Making Such Component
Application:
14/035,834 →
Formulations for the Removal of Particles Generated by Cerium-Containing Solutions
Application:
13/978,825 →
Cluster Ion Implantation of Arsenic and Phosphorus
Application:
14/006,662 →
Method and Materials for Making a Monolithic Porous Pad Cast Onto a Rotatable Base
Application:
14/029,471 →
Substrate Container
Application:
29/467,250 →
Analytical Method for the Measurement of Trace Level Acidic and Basic AMC using Liquid-Free Sample Traps
Application:
61/874,706 →
System and Method for a Pump with Onboard Electronics
Application:
14/019,163 →
Compositions and Methods for Selectively Etching Titanium Nitride
Application:
61/872,297 →
Sustainable Process for Reclaiming Precious Metals and Base Metals from E-Waste
Application:
13/817,868 →
Sensor with protective layer
Application:
61/869,417 →
Silicon Implantation in Substrates and Provision of Silicon Precursor Compositions Therefor
Application:
61/866,918 →
Rectangular Parallelepiped Fluid Storage and Dispensing Vessel
Application:
13/966,091 →
Wafer Container with Door Guide and Seal
Application:
13/880,948 →
Apparatus and Process for Integrated Gas Blending
Application:
13/964,745 →
Scalable Lead Zirconium Titanate (Pzt) Thin Film Material and Deposition Method, and Ferroelectric Memory Device Structures Comprising Such Thin Film Material
Application:
13/960,412 →
Aqueous Formulations for Removing Metal Hard Mask and Post-Etch Residue with Cu/W Compatibility
Application:
61/860,385 →
Porous Metal Body of Sintered Metal Powders and Metal Fibers
Application:
13/982,936 →
Aqueous Cleaner for the Removal of Post-Etch Residues
Application:
13/810,060 →
High Viscosity Re-Circulation Probe
Application:
13/953,497 →
Carbon Pyrolyzate Adsorbent Having Utility for CO2 Capture and Methods of Making and Using the Same
Application:
13/981,376 →
Remote Delivery of Chemical Reagents
Application:
61/857,587 →
Liner-Based Dispenser
Application:
13/988,785 →
Method for Preventing the Collapse of High Aspect Ratio Structures During Drying
Application:
13/819,249 →
Coated CMP Retaining Ring
Application:
61/845,008 →
Composition for and Method of Suppressing Titanium Nitride Corrosion
Application:
13/878,684 →
Front Opening Wafer Container with Door Deflection Minimization
Application:
13/880,944 →
Front Opening Wafer Container with Robotic Flange
Application:
13/880,710 →
Refresh Scheme for Memory Cells with a Weak Retention Time
Application:
61/838,435 →
Front Opening Wafer Container with Wafer Cushion
Application:
13/880,711 →
Etching Solution for Copper or Copper Alloy
Application:
13/816,862 →
Liquid Pressure Sensor with Chromium Adhesion Layer and Fluoropolymer Film
Application:
61/836,390 →
Vacuum Chuck
Application:
61/834,748 →
Molded Rotatable Base for a Porous Pad
Application:
13/915,241 →
Liquid Pressure Sensors with laminated fluoropolymer films and methods of making
Application:
61/832,382 →
Vacuum Chuck
Application:
61/831,656 →
Compositions and Methods for Selectively Etching Titanium Nitride
Application:
61/831,928 →
Tellurium Compounds Useful for Deposition of Tellurium Containing Materials
Application:
13/911,622 →
Take Out Jaws with Seated Componentry
Application:
13/824,909 →
Ion Implanter System Including Remote Dopant Source, and Method Comprising Same
Application:
13/990,760 →
Carbon Adsorbent for Hydrogen Sulfide Removal from Gases Containing Same, and Regeneration of Adsorbent
Application:
13/904,988 →
Enriched Silicon Precursor Compositions and Apparatus and Processes for Utilizing Same
Application:
13/898,809 →
Compositions and Methods for Removing Ceria Particles from a Surface
Application:
61/824,714 →
Preparation of High Pressure BF3/H2 Mixtures
Application:
61/824,709 →
Strontium and Barium Precursors for Use in Chemical Vapor Deposition, Atomic Layer Deposition and Rapid Vapor Deposition
Application:
13/892,526 →
Phase Change Memory Structure Comprising Phase Change Alloy Center-Filled with Dielectric Material
Application:
13/872,087 →
Liner-Based Assembly for Removing Impurities
Application:
13/881,757 →
Copper Cleaning and Protection Formullations
Application:
61/814,518 →
Connectors for Liner-Based Dispense Containers
Application:
13/879,433 →
Method and Apparatus to Help Promote Contact of Gas with Vaporized Material
Application:
13/862,412 →
Substantially Rigid Collapsible Liner, Container and/or Liner for Replacing Glass Bottles, and Enhanced Flexible Liners
Application:
13/878,930 →
Adsorbent Having Utility for CO2 Capture from Gas Mixtures
Application:
13/857,385 →
Material Storage and Dispensing Packages and Methods
Application:
13/854,882 →
Liquid Flow Controller and Precision Dispense Apparatus and System
Application:
13/853,674 →
Diamond Like Carbon Coating of Substrate Housings
Application:
13/847,879 →
Methods and Apparatus for Large Diameter Wafer Handling
Application:
13/847,345 →