IP Library Granted Patent US 10,266,957
Granted Patent B2
US 10,266,957 · App. 13/148,807 · Granted Apr 23, 2019

Chrome-plated part and manufacturing method of the same

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,266,957
App. No.
13/148,807
Granted
Apr 23, 2019
Kind
B2
Abstract

The present invention is to provide a chrome-plated part having a corrosion resistance in normal and specific circumstances and not requiring additional treatments after chrome plating, and to provide a manufacturing method of such a chrome plated part. The chrome-plated part 1 includes: a substrate 2 ; a bright nickel plating layer 5 b formed over the substrate 2 ; a noble potential nickel plating layer 5 a formed on the bright nickel plating layer 5 b . An electric potential difference between the bright nickel plating layer 5 b and the noble potential nickel plating layer 5 a is within a range from 40 mV to 150 mV. The chrome-plated part 1 further includes: a trivalent chrome plating layer 6 formed on the noble potential nickel plating layer 5 a and having at least any one of a microporous structure and a microcrack structure.

Claims (46)

1. A chrome-plated part, comprising:

a substrate;

a bright nickel plating layer formed over the substrate;

a noble potential nickel plating layer formed on the bright nickel plating layer, wherein an electric potential difference between the bright nickel plating layer and the noble potential nickel plating layer is within a range from 78 mV to 150 mV, and the electric potential of the bright nickel plating layer is a base potential with respect to the noble potential nickel plating layer; and

a trivalent chrome plating layer formed on the noble potential nickel plating layer, containing 0.5 at % or more of iron, and having at least any one of a microporous structure or a microcrack structure,

wherein the trivalent chrome plating layer has a microporous density of 180,000/cm 2 or more,

wherein the bright nickel plating layer is manufactured with a first brightening agent and a second brightening agent,

wherein the first brightening agent comprises 1,5-sodium naphthalene disulfonate, 1,3,6-sodium naphthalene trisulfonate, saccharin, or paratoluene sulfonamide, and

wherein the second brightening agent comprises formaldehyde, 1,4-butynediol, propargyl alcohol, ethylene cyanohydrin, coumarin, thiourea, or sodium allylsulfonate.

2. The chrome-plated part according to claim 1 , wherein the trivalent chrome plating layer contains carbon and oxygen.

3. The chrome-plated part according to claim 1 , wherein the trivalent chrome plating layer is produced by basic chromium sulfate as a metal source, and

the trivalent chrome plating layer further contains iron.

4. The chrome-plated part according to claim 1 , wherein the trivalent chrome plating layer contains 4.0 at % or more of carbon.

5. The chrome-plated part according to claim 1 , wherein the trivalent chrome plating layer contains at least one of 1 at % to 20 at % of iron and 10 at % to 20 at % of carbon.

6. The chrome-plated part according to claim 1 , wherein the trivalent chrome plating layer is amorphous.

7. The chrome-plated part according to claim 1 , wherein the bright nickel plating layer contains sulfur.

8. The chrome-plated part according to claim 1 , wherein a thickness of the trivalent chrome plating layer is between 0.15 μm to 0.5 μm.

9. A method of manufacturing a chrome-plated part, comprising:

forming a bright nickel plating layer over a substrate;

forming a noble potential nickel plating layer on the bright nickel plating layer, wherein an electric potential difference between the bright nickel plating layer and the noble potential nickel plating layer is within a range from 78 mV to 150 mV, and the electric potential of the bright nickel plating layer is a base potential with respect to the noble potential nickel plating layer; and

forming a trivalent chrome plating layer on the noble potential nickel plating layer, the trivalent chrome plating layer containing 0.5 at % or more of iron, and having at least any one of a microporous structure or a microcrack structure,

wherein the trivalent chrome plating layer has a microporous density of 180,000/cm 2 or more,

wherein forming the bright nickel plating layer comprises using a first brightening agent and a second brightening agent,

wherein the first brightening agent comprises 1,5-sodium naphthalene disulfonate, 1,3,6-sodium naphthalene trisulfonate, saccharin, or paratoluene sulfonamide, and

wherein the second brightening agent comprises formaldehyde, 1,4-butynediol, propargyl alcohol, ethylene cyanohydrin, coumarin, thiourea, or sodium allylsulfonate.

10. The method of manufacturing a chrome-plated part according to claim 9 , wherein an amount of an electric potential adjuster added in a first plating bath to form the noble potential nickel plating layer is adjusted to be more than that added in a second plating bath to form the bright nickel plating layer.

11. The method of manufacturing a chrome-plated part according to claim 9 , wherein the noble potential nickel plating layer is formed via a first plating bath into which a compound comprising at least any one of silicon and aluminum is dispersed.

12. The method of manufacturing a chrome-plated part according to claim 9 , wherein the noble potential nickel plating layer is formed via a first plating bath into which aluminum oxide is dispersed.

13. The method of manufacturing a chrome-plated part according to claim 9 , wherein the electric potential difference between the bright nickel plating layer and the noble potential nickel plating layer is within a range from 78 mV to 120 mV.

14. A chrome-plated part, comprising:

a substrate;

a bright nickel plating layer formed over the substrate;

a noble potential nickel plating layer formed on the bright nickel plating layer, wherein an electric potential difference between the bright nickel plating layer and the noble potential nickel plating layer is within a range from 78 mV to 150 mV, and the electric potential of the bright nickel plating layer is a base potential with respect to the noble potential nickel plating layer; and

a trivalent chrome plating layer formed on the noble potential nickel plating layer, containing 0.5 at % or more of iron, and having at least any one of a microporous structure or a microcrack structure,

wherein the trivalent chrome plating layer has a microporous density of 180,000/cm 2 or more,

wherein the bright nickel plating layer comprises a first brightening agent and a second brightening agent,

wherein the first brightening agent comprises 1,5-sodium naphthalene disulfonate, 1,3,6-sodium naphthalene trisulfonate, saccharin, or paratoluene sulfonamide, and

wherein the second brightening agent comprises formaldehyde, 1,4-butynediol, propargyl alcohol, ethylene cyanohydrin, coumarin, thiourea, or sodium allylsulfonate.

15. The chrome-plated part according to claim 14 , wherein the trivalent chrome plating layer contains carbon and oxygen.

16. The chrome-plated part according to claim 14 , wherein the trivalent chrome plating layer is produced by basic chromium sulfate as a metal source, and

the trivalent chrome plating layer further contains iron.

17. The chrome-plated part according to claim 14 , wherein the trivalent chrome plating layer contains 4.0 at % or more of carbon.

18. The chrome-plated part according to claim 14 , wherein the trivalent chrome plating layer contains at least one of 1 at % to 20 at % of iron and 10 at % to 20 at % of carbon.

19. The chrome-plated part according to claim 14 , wherein the trivalent chrome plating layer is amorphous.

20. The chrome-plated part according to claim 14 , wherein the bright nickel plating layer contains sulfur.

21. The chrome-plated part according to claim 14 , wherein a thickness of the trivalent chrome plating layer is between 0.15 μm to 0.5 μm.

Assignments (3)
RELEASE OF SECURITY INTEREST Recorded Mar 18, 2021
From: BARCLAYS BANK PLC, AS COLLATERAL AGENT
To: ATOTECH DEUTSCHLAND GMBH; ATOTECH USA, LLC
Reel/Frame 055653/0714 →
SECURITY INTEREST Recorded Feb 1, 2017
From: ATOTECH DEUTSCHLAND GMBH; ATOTECH USA INC
To: BARCLAYS BANK PLC, AS COLLATERAL AGENT
Reel/Frame 041590/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 15, 2011
From: SUGAWARA, SOICHIRO; SAKAI, HIROSHI; HARTMANN, PHILIP
To: NISSAN MOTOR CO., LTD.; ATOTECH DEUTSCHLAND GMBH
Reel/Frame 027229/0489 →