Schottky diodes
View Patent ↗Improved Schottky diodes with reduced leakage current and improved breakdown voltage are provided by building a JFET with its current path of a first conductivity type serially located between a first terminal comprising a Schottky contact and a second terminal. The current path lies (i) between multiple substantially parallel finger regions of a second, opposite, conductivity type substantially laterally outboard of the Schottky contact, and (ii) partly above a buried region of the second conductivity type that underlies a portion of the current path, which regions are electrically coupled to the first terminal and the Schottky contact and which portion is electrically coupled to the second terminal. When reverse bias is applied to the first terminal and Schottky contact, the current path is substantially pinched off in vertical or horizontal directions or both, thereby reducing the leakage current and improving the breakdown voltage of the device.
1. A Schottky diode having first and second terminals, comprising:
a semiconductor (SC) substrate having a first region of a first conductivity type and first doping concentration proximate a first surface of the substrate;
a Schottky electrode contact on the first surface of the first region forming a Schottky junction therebetween, wherein the Schottky electrode contact is ohmically coupled to the first terminal;
a second region of the first conductivity type and second doping, contacting the first region, laterally separated from the Schottky electrode contact and ohmically coupled to the second terminal;
multiple finger regions of a second, opposite, conductivity type and third doping ohmically coupled to the first terminal and extending from the first region into the second region, wherein first portions of the second region lies between the multiple finger regions; and
a further region of the second conductivity type and fourth doping, located in the second region spaced apart from the first surface by the first portions of the second region and ohmically coupled to the first terminal,
wherein the further region, the multiple finger regions and the second region form a junction field effect transistor (JFET), with the further region and the multiple substantially parallel finger regions adapted to act as gates of the JFET and the second region adapted to contain a channel of the JFET.
2. The diode of claim 1 , where the multiple finger regions are substantially parallel.
3. The diode of claim 1 , where the multiple finger regions are divided substantially into two groups, a first group of multiple substantially parallel finger regions extending away from the Schottky electrode contact in a first direction and a second group of multiple substantially parallel finger regions extending away from the Schottky electrode contact in a second direction.
4. The diode of claim 3 , wherein the first and second directions are substantially anti-parallel.
5. The diode of claim 1 , wherein the multiple finger regions are more heavily doped than portions of the second region lying between the multiple finger regions, and wherein the multiple finger regions are comparably or more heavily doped than the first region.
6. The diode of claim 1 , wherein first region is comparably or more heavily doped than the first portions of the second region.
7. The diode of claim 1 , therein the further region underlies at least part of the first portion of the second region.
8. The diode of claim 7 , wherein the further region also underlies at least part of the second portion of the second region or the first region.
9. The diode of claim 1 , wherein when the diode is reverse biased, the channel of the JFET is substantially depleted of free carriers for voltages above a predetermined magnitude.
10. A Schottky device, comprising:
first and second terminals, wherein the first terminal comprises a Schottky contact;
a JFET within the Schottky device having a current path of a first conductivity type serially coupled between the first terminal and the second terminal;
multiple finger regions laterally outboard of the Schottky contact and of a second, opposite, conductivity type and substantially enclosing a portion of the current path between the first terminal and the second terminal; and
a buried region of the second conductivity type at least partly underlying the current path and ohmically coupled to the multiple finger regions,
wherein the multiple finger regions and the buried region are electrically coupled to the first terminal and adapted to at least partially pinch off the current path in response to a reverse bias applied between the first terminal and the second terminal.
11. The device of claim 10 , wherein the buried region intersects a portion of the multiple finger regions.
12. The device of claim 10 , wherein the multiple finger regions are substantially parallel or anti-parallel.
13. The device of claim 12 , wherein about half of the multiple finger regions are located on a first side of the Schottky contact and about half are located on a second side of the Schottky contact.
14. The device of claim 10 , wherein the current path is N type.
15. The device of claim 14 , wherein the multiple finger regions are more heavily doped than at least part of the current path.
16. A Schottky diode comprising:
a semiconductor containing substrate having an upper surface;
an upper portion of the substrate doped to have a first conductivity type extending substantially to the upper surface;
multiple spaced-apart finger regions of a second, opposite conductivity type, wherein first parts of the upper portion of the substrate lie between some of the spaced-apart finger regions;
a buried further region of the second, opposite, conductivity type underlying at least part of the first parts of the upper portion;
a Schottky contact on a part of the upper surface lying laterally beyond the spaced-apart finger regions;
a first terminal of the device coupled to the spaced-apart finger regions, the further buried region, and the Schottky contact; and
a second terminal of the device coupled to a second part of the upper portion.
17. The diode of claim 16 , wherein:
the upper portion has a first doping concentration; and
the multiple spaced-apart finger regions have a second doping concentration that is comparable with or exceeds the first doping concentration.
18. The diode of claim 17 , wherein the buried further region has a third doping concentration less than the second doping concentration.
19. The diode of claim 16 , wherein the upper portion and the further buried region have doping concentrations that differ by less than an order of magnitude.